Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Johannes Plauth"'
Autor:
Brian Colombo, Umberto Iessi, Paolo Canestrari, Johannes Plauth, Elio De Chiara, Benedetta Triulzi
Publikováno v:
SPIE Proceedings.
CD uniformity budget for a 45-nm NV memory device requires the analysis and compensation of each single contributor factor. A dedicated simulation tool "CDU Predictor" helps to quantify the impact of main scanner and process factors for a comprehensi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0cf0182ffe32cffacac93fc21b68a892
https://doi.org/10.1117/12.846538
https://doi.org/10.1117/12.846538
Autor:
Paolo Canestrari, Gianfranco Capetti, Umberto Iessi, Elio De Chiara, Sanne Smit, Pierluigi Rigolli, Leonardo Amato, Lionel Brige, Christine Llorens, Johannes Plauth
Publikováno v:
SPIE Proceedings.
Aggressive pitch requirements for line/space pattern devices require the usage of extreme off-axis illumination schemes to enhance the resolution of the exposure tools. These illumination schemes stress the quality of the optics because of the anisot
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6144dae1aeb7c630337e5be423f0a140
https://doi.org/10.1117/12.814148
https://doi.org/10.1117/12.814148
Autor:
Johannes Plauth, Allan Dunbar, Giovanni Rivera, Guido Miraglia, Merritt Phillips, Pui Leng Lam, Elisabetta Castellana, Laura Rozzoni
Publikováno v:
SPIE Proceedings.
ATHENA is the new alignment system designed to minimize the alignment offset due to mark-deformation as induced by a WCMP process. We report the results of its evaluation at STMicroelectronics for a 0.25 μm-device which employs six metal-interconnec
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bdcee1cbe6b3b43a880ce4112ba437a8
https://doi.org/10.1117/12.386498
https://doi.org/10.1117/12.386498
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