Zobrazeno 1 - 10
of 12
pro vyhledávání: '"Johannes Jacobus Lambertus Mulders"'
Autor:
Adriaan J. M. Mackus, Nick F. W. Thissen, Zhihong Chen, Petrus Hubertus Franciscus Trompenaars, Johannes Jacobus Lambertus Mulders, Wilhelmus M. M. Kessels, Ageeth A. Bol
Publikováno v:
Applied Physics Letters, 110(1):013101, 1-5. American Institute of Physics
Carbon nanotubes are considered as alternative channel material for future transistors, but several challenges exist for reliable fabrication of these devices. In this work, carbon nanotube field-effect transistors (CNTFETs) were fabricated by patter
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d8a2dcd930a9733654415fcb1d37b6ce
https://doi.org/10.1063/1.4973359
https://doi.org/10.1063/1.4973359
Publikováno v:
Microscopy and Microanalysis. 23:321-328
Six precursors were evaluated for use as in situ electron beam-induced deposition capping layers in the preparation of atom probe tomography specimens with a focus on near-surface features where some of the deposition is retained at the specimen apex
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7e19aa2ba8f8667e8dd9ccad5e432487
https://doi.org/10.1017/s1431927616011740
https://doi.org/10.1017/s1431927616011740
Applications of an in-situ Low Energy Argon Ion Source for Improvement of TEM and SEM Sample Quality
Publikováno v:
Microscopy and Microanalysis. 23:298-299
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::95d50306d31bfcbc214099bfc196a0a6
https://doi.org/10.1017/s1431927617002173
https://doi.org/10.1017/s1431927617002173
Publikováno v:
Journal of Vacuum Science & Technology B, 26 (6), 2008
Electron-beam-induced deposition of platinum from methylcyclopentadienyl-platinum-trimethyl was performed with a focused electron beam at low landing energies, down to 10?eV. The deposition growth rate is maximal at 140?eV, with the process being ove
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::43cd413a97670e37dab50c517b5ec92b
https://doi.org/10.1116/1.2976576
https://doi.org/10.1116/1.2976576
Publikováno v:
Microelectronic Engineering. 85:1139-1142
Electron-beam-induced deposition (EBID) allows nano-scale three-dimensional rapid prototyping and is a promising nano-lithography alternative. One application is to write conductive lines at a position chosen by the scanning electron microscope (SEM)
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e1aee47df3ed60ff4df45cc04ace9a7b
https://doi.org/10.1016/j.mee.2007.12.036
https://doi.org/10.1016/j.mee.2007.12.036
Publikováno v:
Microelectronic Engineering. 84:1540-1543
Focused ion beam systems are applied for the creation of nano-scale structures by patterned milling into a substrate. For a given material, the local dose (nC) determines the amount of material (@mm^3) removed by the beam: this volume per dose is ref
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1a7c44d33b3c37340df3bd57d8954127
https://doi.org/10.1016/j.mee.2007.01.206
https://doi.org/10.1016/j.mee.2007.01.206
Publikováno v:
Nanotechnology. 17:3779-3785
The technique of electron-beam-induced deposition (EBID), when performed with organic precursors, typically results in relatively low metal content due to the partial decomposition of the organic precursor, leaving carbon-rich remnants in the deposit
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c28e61203c3e2331dd444da2a7e68138
https://doi.org/10.1088/0957-4484/17/15/028
https://doi.org/10.1088/0957-4484/17/15/028
Publikováno v:
Microscopy and Microanalysis. 22:630-631
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::97b8410bf0810758da0f3660bcd6dbbe
https://doi.org/10.1017/s1431927616004001
https://doi.org/10.1017/s1431927616004001
Publikováno v:
Microscopy and Microanalysis. 20:1142-1143
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e154a0dca893f235ecf18a231ca668f6
https://doi.org/10.1017/s1431927614007442
https://doi.org/10.1017/s1431927614007442
Publikováno v:
Nanotechnology, 20 (37)
The creation of functional nanostructures by electron-beam-induced deposition (EBID) is becoming more widespread. The benefits of the technology include fast 'point-and-shoot' creation of three-dimensional nanostructures at predefined locations direc
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4653871325cc472052a7571120a5fb32
http://resolver.tudelft.nl/uuid:3ff04146-83d7-46a1-984b-f92d5e1ad787
http://resolver.tudelft.nl/uuid:3ff04146-83d7-46a1-984b-f92d5e1ad787