Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Johannes F. H. Risch"'
Autor:
Marion Kuhlmann, Jan Perlich, Markus Drescher, Benjamin Dicke, Johannes F. H. Risch, Kuhu Sarkar, Ralph Döhrmann, Peter Müller-Buschbaum, Gonzalo Santoro, Matthias Schwartzkopf, Ezzeldin Metwalli, Stephan V. Roth, Shun Yu, Philipp Wessels, Sebastian Bommel
Publikováno v:
The Journal of Physical Chemistry Letters. 4:3170-3175
The formation of metal/organic interfaces is a complicated process involving chemical interaction, physical nucleation and diffusion, and thin film growth. It is closely related to the performance of organic electronic devices. To understand this pro
Autor:
Gerd Herzog, Stephan V. Roth, Gunthard Benecke, Shun Yu, Jan Perlich, Adeline Buffet, Gonzalo Santoro, Matthias Schwartzkopf, Johannes F. H. Risch, Berit Heidmann, Wilfried Wurth
Publikováno v:
Langmuir. 29:11260-11266
We investigated the spray deposition and subsequent self-assembly during drying of a polystyrene nanoparticle dispersion with in situ grazing incidence small-angle X-ray scattering at high time resolution. During the fast deposition of the dispersion
Autor:
Rainer Gehrke, Ralf Röhlsberger, Jan Perlich, Johannes F. H. Risch, Peter Müller-Buschbaum, D. Erb, Matthias Schwartzkopf, Stephan V. Roth, Volker Körstgens
Publikováno v:
physica status solidi (RRL) - Rapid Research Letters. 6:253-255
Autor:
Michael Rübhausen, Peng Zhang, Johannes F. H. Risch, Gonzalo Santoro, Matthias Schwartzkopf, Sarathlal Koyiloth Vayalil, Concepción Domingo, Stephan V. Roth, Shun Yu, Margarita Hernández
Publikováno v:
Digital.CSIC. Repositorio Institucional del CSIC
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instname
The fabrication of substrates for Surface Enhanced Raman Scattering (SERS) applications matching the needs for high sensitive and reproducible sensors remains a major scientific and technological issue. We correlate the morphological parameters of si
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2dd57a72d1992c97f726ff22cbe91297
http://hdl.handle.net/10261/110705
http://hdl.handle.net/10261/110705
Autor:
Kai Schlage, Sebastian Bommel, Roman Mannweiler, Adeline Buffet, Ezzeldin Metwalli, Stephan Botta, Stephan V. Roth, Gonzalo Santoro, Matthias Schwartzkopf, Johannes F. H. Risch, Ralph Döhrmann, Peter Müller-Buschbaum, Simon Brunner
Publikováno v:
Review of scientific instruments 84, 043901 (2013). doi:10.1063/1.4798544
Review of scientific instruments 84, 043901 (2013). doi:10.1063/1.4798544
HASE (Highly Automated Sputter Equipment) is a new mobile setup developed to investigate deposition processes with synchrotron radiation. HASE is based on an ultra-high va
HASE (Highly Automated Sputter Equipment) is a new mobile setup developed to investigate deposition processes with synchrotron radiation. HASE is based on an ultra-high va