Zobrazeno 1 - 10
of 51
pro vyhledávání: '"Johanna Eichhorn"'
Autor:
Alex Henning, Johannes D. Bartl, Lukas Wolz, Maximilian Christis, Felix Rauh, Michele Bissolo, Theresa Grünleitner, Johanna Eichhorn, Patrick Zeller, Matteo Amati, Luca Gregoratti, Jonathan J. Finley, Bernhard Rieger, Martin Stutzmann, Ian D. Sharp
Publikováno v:
Advanced Materials Interfaces, Vol 10, Iss 6, Pp n/a-n/a (2023)
Abstract Atomic layer deposition (ALD) is a key technique for the continued scaling of semiconductor devices, which increasingly relies on scalable processes for interface manipulation of structured surfaces on the atomic level. While ALD allows the
Externí odkaz:
https://doaj.org/article/63c8b30326a043ad9591dcf50f6b1397
Autor:
Johanna Eichhorn, Christoph Kastl, Jason K. Cooper, Dominik Ziegler, Adam M. Schwartzberg, Ian D. Sharp, Francesca M. Toma
Publikováno v:
Nature Communications, Vol 9, Iss 1, Pp 1-8 (2018)
The performance of energy materials is affected by structural defects, as well as physicochemical heterogeneity over different length scales. Here the authors map nanoscale correlations between morphological and functional heterogeneity, quantifying
Externí odkaz:
https://doaj.org/article/d4ad5989756e4c4eb02131b789d9247a
Autor:
Theresa Grünleitner, Alex Henning, Michele Bissolo, Marisa Zengerle, Luca Gregoratti, Matteo Amati, Patrick Zeller, Johanna Eichhorn, Andreas V. Stier, Alexander W. Holleitner, Jonathan J. Finley, Ian D. Sharp
Publikováno v:
ACS Nano. 16:20364-20375
Autor:
Umberto Savino, Johanna Eichhorn, Guiji Liu, Adriano Sacco, Marco Laurenti, Ruchira Chatterjee, Guosong Zeng, Micaela Castellino, Katarzyna Bejtka, Junko Yano, Elena Maria Tresso, Angelica Chiodoni, Francesca Maria Toma
Publikováno v:
The Journal of Physical Chemistry C. 126:6223-6230
Autor:
Yuqin Zou, Shuai Yuan, Ali Buyruk, Johanna Eichhorn, Shanshan Yin, Manuel A. Reus, Tianxiao Xiao, Shambhavi Pratap, Suzhe Liang, Christian L. Weindl, Wei Chen, Cheng Mu, Ian D. Sharp, Tayebeh Ameri, Matthias Schwartzkopf, Stephan V. Roth, Peter Müller-Buschbaum
Publikováno v:
ACS Applied Materials & Interfaces. 14:2958-2967
Autor:
Viktoria F. Kunzelmann, Chang-Ming Jiang, Irina Ihrke, Elise Sirotti, Tim Rieth, Alex Henning, Johanna Eichhorn, Ian D. Sharp
Publikováno v:
Journal of Materials Chemistry A. 10:12026-12034
We demonstrate a facile approach to solution-based synthesis of wafer-scale epitaxial bismuth vanadate (BiVO4) thin films by spin-coating on yttria-stabilized zirconia. Epitaxial growth proceeds via solid-state transformation of initially formed poly
Autor:
Yuqin Zou, Johanna Eichhorn, Sebastian Rieger, Yiting Zheng, Shuai Yuan, Lukas Wolz, Lukas V. Spanier, Julian E. Heger, Shanshan Yin, Christopher R. Everett, Linjie Dai, Matthias Schwartzkopf, Cheng Mu, Stephan V. Roth, Ian D. Sharp, Chun-Chao Chen, Jochen Feldmann, Samuel D. Stranks, Peter Müller-Buschbaum
Publikováno v:
Nano Energy. 112:108449
Publikováno v:
ACS Applied Materials & Interfaces. 13:23575-23583
The photoelectrochemical performance of thin film photoelectrodes can be impacted by deviations from the stoichiometric composition, both at the macroscale and at the nanoscale. This issue is especially pronounced for the class of ternary compounds t
Autor:
Matthias Kuhl, Alex Henning, Lukas Haller, Laura Wagner, Chang-Ming Jiang, Verena Streibel, Ian Sharp, Johanna Eichhorn
Disordered and porous metal oxides are promising as earth-abundant and cost-effective alternatives to noble-metal electrocatalysts. Herein, we leverage non-saturated oxidation in plasma-enhanced atomic layer deposition to tune structural, mechanical,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::92007c287aebdc030e203ec4d9bbd06e
https://doi.org/10.26434/chemrxiv-2022-23ck4
https://doi.org/10.26434/chemrxiv-2022-23ck4
Autor:
Matthias Kuhl, Alex Henning, Lukas Haller, Laura I. Wagner, Chang‐Ming Jiang, Verena Streibel, Ian D. Sharp, Johanna Eichhorn
Disordered and porous metal oxides are promising earth-abundant and cost-effective alternatives to noble-metal electrocatalysts. Herein, nonsaturated oxidation in plasma-enhanced atomic layer deposition is leveraged to tune the structural, mechanical
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4afadfd688e4294dd54ffaff7a1bf8fe
https://mediatum.ub.tum.de/1699884
https://mediatum.ub.tum.de/1699884