Zobrazeno 1 - 10
of 15
pro vyhledávání: '"Johan Böhlmark"'
Publikováno v:
JETP Letters. 100:680-687
For the first time hard aluminum magnesium boride films were fabricated by RF magnetron sputtering from a single stoichiometric ceramic AlMgB14 target. Optimized processing conditions (substrate temperature, target sputtering power and target-to-subs
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0d685a8424f97c3afed03e5a4f36cb42
https://doi.org/10.1134/s0021364014220056
https://doi.org/10.1134/s0021364014220056
Publikováno v:
Materials Science Forum. 681:145-150
This paper presents measurements and cutting tests related to coating features on sharp cutting edges and rounded objects. One typical feature of plasma based deposition processes is the formation of a sheath region around the object to be coated. Th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a68a02ac999ea0ee0ecec3475cec9d7f
https://doi.org/10.4028/www.scientific.net/msf.681.145
https://doi.org/10.4028/www.scientific.net/msf.681.145
Publikováno v:
Ionics. 14:471-476
Apatite-type La9.33Si6O26 thin films were elaborated by co-sputtering of two metallic La and Si targets powered, respectively, by high power impulse magnetron sputtering and direct current sources, in pure Ar atmosphere, followed by a subsequent high
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ef5caf8497e2e961fc1b887df2ac99c1
https://doi.org/10.1007/s11581-008-0239-7
https://doi.org/10.1007/s11581-008-0239-7
Autor:
Arutiun P. Ehiasarian, Martina Lattemann, Y. Aranda Gonzalvo, Jon Tomas Gudmundsson, Johan Böhlmark, Nils Brenning, Ulf Helmersson
Publikováno v:
Thin Solid Films. 515:1522-1526
The energy distribution of sputtered and ionized metal atoms as well as ions from the sputtering gas is reported for a high power impulse magnetron sputtering (HIPIMS) discharge. High power pulses ...
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c0b6636ef5c6182873eed6fde7028530
https://doi.org/10.1016/j.tsf.2006.04.051
https://doi.org/10.1016/j.tsf.2006.04.051
Publikováno v:
Thin Solid Films. 515:1928-1931
In plasma assisted thin film growth, control over the energy and direction of the incoming species is desired. If the growth species are ionized this can be achieved by the use of a substrate bias or a magnetic field. Ions may be accelerated by an ap
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::01815569bc665e7983ff76126fb7f2c9
https://doi.org/10.1016/j.tsf.2006.07.183
https://doi.org/10.1016/j.tsf.2006.07.183
Publikováno v:
Plasma Sources Science and Technology. 14:525-531
We report on electrostatic probe measurements of a high-power pulsed magnetron discharge. Space- and time-dependent characteristics of the plasma parameters are obtained as functions of the process parameters. By applying high-power pulses (peak powe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9f7f149e9e0984674d12086e95fead72
https://doi.org/10.1088/0963-0252/14/3/015
https://doi.org/10.1088/0963-0252/14/3/015
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 23:18-22
The ion to neutral ratio of the sputtered material have been studied for high power pulsed magnetron sputtering and compared with a continuous direct current (dc) discharge using the same experimental setup except for the power source. Optical emissi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::506224e7a44f4b1b92539b0632b420f0
https://doi.org/10.1116/1.1818135
https://doi.org/10.1116/1.1818135
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 23:278-280
We have synthesized Ta thin films on Si substrates placed along a wall of a 2-cm-deep and 1-cm-wide trench, using both a mostly neutral Ta flux by conventional dc magnetron sputtering (dcMS) and a mostly ionized Ta flux by high-power pulsed magnetron
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::040550d5cad1b7ae9ba36a9dd60a6d85
https://doi.org/10.1116/1.1861049
https://doi.org/10.1116/1.1861049
Autor:
Esteban Broitman, Rainer Prof. Dr. Cremer, Zs. Czigany, Grzegorz Greczynski, Johan Böhlmark, Lars Hultman
Highly adherent carbon nitride (CNx) films were deposited using a novel pretreatment with two high power impulse magnetron sputtering (HIPIMS) power supplies in a master-slave configuration: one to establish the discharge and one to produce a pulsed
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::daaa18870c2bd441f194fe8e79695203
http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-58178
http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-58178
The microstructure and composition of CrNx (0 andlt;= x andlt;= 1) films grown by reactive high power pulsed magnetron sputtering (HIPIMS or HPPMS) have been studied as a function of the process parameters: N-2-to-Ar discharge gas ratio, (f(N2/Ar)),
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::94fac904eb414447784fa0edfd4e6685
http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-60689
http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-60689