Zobrazeno 1 - 10
of 19
pro vyhledávání: '"Joern-Holger Franke"'
Autor:
Andreas Frommhold, Joern-Holger Franke, Tatiana Kovalevich, Eelco van Setten, Vidya Vaenkatesan
Publikováno v:
Optical and EUV Nanolithography XXXVI.
Publikováno v:
Optical and EUV Nanolithography XXXVI.
Autor:
Inhwan Lee, Joern-Holger Franke, Vicky Philipsen, Kurt Ronse, Stefan De Gendt, Eric Hendrickx
Publikováno v:
Optical and EUV Nanolithography XXXVI.
Publikováno v:
Journal of Micro/Nanopatterning, Materials, and Metrology. 22
Autor:
Timothy A. Brunner, Vincent Truffert, Christopher Ausschnitt, Nicola Kissoon, Edouard Duriau, Tom Jonckers, Lieve van Look, Joern-Holger Franke
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2022.
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2022.
Autor:
Jara Santaclara, Weimin Gao, Eric Hendrickx, Vincent Wiaux, Joern-Holger Franke, Emily Gallagher, Kannan Keizer, Tatiana Kovalevich, Jo Finders
Publikováno v:
Optical and EUV Nanolithography XXXV.
Autor:
Joern-Holger Franke, Andreas Frommhold, Arnaud Dauendorffer, Kathleen Nafus, Gijsbert Rispens, Mark Maslow
Publikováno v:
Journal of Micro/Nanopatterning, Materials, and Metrology. 21
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2021.
We have conducted a series of experiments to study how defectivity depends on NILS, aerial image intensity and depth-of-focus. Three sets of illuminations were designed to vary only one of these parameters while keeping the others constant for a 48 n
Autor:
David Rio, Chris Spence, Kateryna Lyakhova, Joern-Holger Franke, Maxence Delorme, Paul van Adrichem
Publikováno v:
Extreme Ultraviolet (EUV) Lithography XII.
The purpose of our study is to evaluate the benefit of contrast enhancement strategies on a logic metal layer at pitch 28 nm. We build up on three studies from imec and ASML [1][2][3]. We take as a reference a Negative Tone Development (NTD) Metal Ox