Zobrazeno 1 - 10
of 25
pro vyhledávání: '"Joerg Thiele"'
Autor:
Benjamin Zander, Jörg Thiele
Schulsportforschung und Jugendsportforschung stehen noch häufig unverbunden nebeneinander. Dieses Defizit versucht die vorliegende Studie zu bearbeiten, indem sie sportive Orientierungen von Jugendlichen in den Kontexten von Schule und Freizeit reko
Autor:
Bernd Ralle, Jörg Thiele
Sinnstiftung durch kontextorientiertes Lernen, also die Rückbindung der Lerngegenstände an die persönlichen Lebenswelten der Lernenden, findet seit einiger Zeit wieder eine breitere Beachtung in der Lehr-Lernforschung. In Bezug auf die Auswahl rel
Dieses Buch beschreibt den Prozess und die Ergebnisse des von der Universität Dortmund wissenschaftlich begleiteten Pilotprojekts'Tägliche Sportstunde an Grundschulen in NRW', in dem versucht wurde, auf der Basis einer breit angelegten Längsschnit
Autor:
Josef Gabelsberger, Hermann Tebbe, Michael Pohlscheidt, Alexander Jockwer, Melanie Jacobs, Marco Jenzsch, Josef Burg, Stefan Wolf, Joerg Thiele
Publikováno v:
Biotechnology progress. 29(1)
Increasing capacity utilization and lowering manufacturing costs are critical for pharmaceutical companies to improve their competitiveness in a challenging environment. Development of next generation cell lines, improved media formulations, applicat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::52b488f846ee299bb3bfc379f2bf2a8a
https://pubmed.ncbi.nlm.nih.gov/23225663
https://pubmed.ncbi.nlm.nih.gov/23225663
Autor:
Joerg Thiele, Michael L. Rieger
Publikováno v:
Design for Manufacturability through Design-Process Integration IV.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::27a5709115ee151bd6277a4a4cefa654
https://doi.org/10.1117/12.863953
https://doi.org/10.1117/12.863953
Autor:
Molela Moukara, Wolfram Koestler, Wolfgang Dettmann, Mario Hennig, Thorsten Winkler, Karsten Zeiler, Joerg Thiele
Publikováno v:
Optical Microlithography XVIII.
In DRAM technology, rapidly decreasing critical dimensions cause a strong need in lithography for optimization of illumination conditions. In critical line levels, this will lead to an increasing demand for application of different, specially optimiz
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9c4f9f2a3aaf69a54dc6f8c77d528c64
https://doi.org/10.1117/12.599441
https://doi.org/10.1117/12.599441
Autor:
Thomas Roessler, Joerg Thiele
Publikováno v:
Design and Process Integration for Microelectronic Manufacturing III.
Recently, "design for manufacturability" (DFM) has become a veritable buzzword in the semiconductor manufacturing community. DFM activities cover a broad spectrum ranging from the improvement of the electrical and structural robustness against proces
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e21604655b53de71f43e010bfb8b5c1e
https://doi.org/10.1117/12.595062
https://doi.org/10.1117/12.595062
Autor:
Joerg Thiele, Guido Thielscher, M. Eisenhut, Detlef Hofmann, Wolfgang Dettmann, Rainer Pforr, Mario Hennig
Publikováno v:
SPIE Proceedings.
Contact layers of the DRAM manufacturing process can be printed well using alternating phase-shifting masks. State-of-the-art mask making tools have sufficient performance to manufacture defect free contact masks. The enlarged process window compared
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::99c0254fbdc227715e32ce4f4b521ebb
https://doi.org/10.1117/12.568032
https://doi.org/10.1117/12.568032
Publikováno v:
SPIE Proceedings.
The lithographic potential of various mask types for the printing of 65nm features has been investigated by simulation and experimentation. As key parameters process window, mask error enhancement factor, balancing performance, and phase and CD error
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d84af648eedde29106d9b1fac9e285d5
https://doi.org/10.1117/12.534091
https://doi.org/10.1117/12.534091
Autor:
Rainer Pforr, Burkhard Ludwig, Mario Hennig, Nicolo Morgana, Marco Ahrens, Wolfgang Dettmann, Roderick Koehle, Joerg Thiele
Publikováno v:
SPIE Proceedings.
The lithographic potential of alternating PSM for sub-100nm gate patterning have been evaluated in comparison to alternative techniques. The status of the key elements of the full level alternating PSM approach including design conversion, optical pr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8622f94e193eb79e06258ce44fc43cb6
https://doi.org/10.1117/12.485521
https://doi.org/10.1117/12.485521