Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Joerg Reiss"'
Autor:
Jeffrey A Schefske, Anna Minvielle, Lovejeet Singh, Terry Manchester, David Tien, Joerg Reiss, John C. Robinson, Kelly O'Brien, Eric Kent, Jim Manka, Brad Eichelberger
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXIII.
Overlay control is gaining more attention in recent years as technology moves into the 32nm era. Strict overlay requirements are being driven not only by the process node but also the process techniques required to meet the design requirements. Doubl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2a9446ae0e9fd551c5d86dd5b55aeb16
https://doi.org/10.1117/12.814256
https://doi.org/10.1117/12.814256
Autor:
Kuo-Tung Chang, Amol Ramesh Joshi, Kelwin Ko, Makoto Takahashi, Yu Sun, Marina V. Plat, Siu Ho, Arjun Rangarajan, Shenqing Fang, Kazuhiro Mizutani, Wing Leung, John Wang, Hiroyuki Ogawa, Ming Kwan, Sung-Chul Lee, Hiro Kinoshita, Sheung-Hee Park, Joerg Reiss
Publikováno v:
Scopus-Elsevier
In floating gate (FG) NOR flash memory arrays, word lines (WL) bend at Vss columns to accommodate the Vss contacts. As the memory cell is scaled down, patterning of the WL bending becomes more and more challenging. Furthermore, to ensure that the WL
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e033590ea776e280bb67ed5b1ea69672
http://www.scopus.com/inward/record.url?eid=2-s2.0-46849095127&partnerID=MN8TOARS
http://www.scopus.com/inward/record.url?eid=2-s2.0-46849095127&partnerID=MN8TOARS
