Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Joel L. Seligson"'
Publikováno v:
SPIE Proceedings.
Resolution enhancement in advanced optical lithography will reach a new plateau of complexity at the 32 nm design rule manufacturing node. In order to circumvent the fundamental optical resolution limitations, ultra low k1 printing processes are bein
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::810e0cd413dac7251feee2227d30837c
https://doi.org/10.1117/12.773243
https://doi.org/10.1117/12.773243
Autor:
Joel L. Seligson, Aviv Frommer
Publikováno v:
SPIE Proceedings.
The overlay budgets in leading-edge processes are expected to shrink below 20nm within the next 12-24 months. The demand for ever higher accuracies of overlay metrology for the 65nm node and below drive the development and design of new optical metro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::957b8a143d7944542a50a3997a8bce73
https://doi.org/10.1117/12.599059
https://doi.org/10.1117/12.599059
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XVIII.
We have developed a method for calculating the statistical effects of spatial noise on the overlay measurement extracted from a given overlay target. The method has been applied to two kinds of overlay targets on three process layers, and the new met
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::975438d0a85a9efd313122042ef98d33
https://doi.org/10.1117/12.534515
https://doi.org/10.1117/12.534515
Publikováno v:
SPIE Proceedings.
While overlay precision has received much focus in the past, overlay accuracy has become more significant with shrinking process budgets. One component of accuracy is the difference between pre-etch (DI) and post-etch (FI) overlay, which is a functio
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::19826984998ef4995cfbd0f8b80f6f63
https://doi.org/10.1117/12.473466
https://doi.org/10.1117/12.473466
Publikováno v:
SPIE Proceedings.
As overlay budgets shrink with design rules, the importance of overlay metrology accuracy increases. We have investigated the overlay accuracy of a 0.18mm design rule Copper-Dual-Damascene process by comparing the overlay metrology results at the Aft
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3ab019bbd980d7177bf2a4a1171af359
https://doi.org/10.1117/12.473477
https://doi.org/10.1117/12.473477
Publikováno v:
SPIE Proceedings.
In order to control and minimize overlay metrology errors, we have to deal with a number of design parameters both in the metrology tool domain and in the overlay target domain. For enhancing the rate of performance improvement vs. technology investm
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4cd9fde8ab69fb87d0f79295ca3e9205
https://doi.org/10.1117/12.473469
https://doi.org/10.1117/12.473469
Autor:
Ibrahim Abdulhalim, Yiping Xu, John A. Allgair, Piotr Zalicki, Michael Faeyrman, Lloyd C. Litt, Robert R. Hershey, Umar K. Whitney, David C. Benoit, John C. Robinson, William Braymer, Joel L. Seligson
Publikováno v:
SPIE Proceedings.
The continuing demand for higher frequency microprocessors and larger memory arrays has led to decreasing device dimensions and smaller process control windows. Decreasing process control windows have created a need for higher precision metrology to
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::14685d5170748b6775f51ceb8d71af51
https://doi.org/10.1117/12.386465
https://doi.org/10.1117/12.386465
Publikováno v:
SPIE Proceedings.
Bright field optical microscopy has well-known nonlinearity problems due to varying film thickness. Phase images eliminate many of these problems. This paper will describe the advantages of phase imaging, based on calculated results. Experimental cor
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d2cff13d7474f845cdf7cd2a3d727a6d
https://doi.org/10.1117/12.149020
https://doi.org/10.1117/12.149020
Autor:
Honggoo Lee, Sangjun Han, Minhyung Hong, Seungyong Kim, Jieun Lee, DongYoung Lee, Eungryong Oh, Ahlin Choi, Park, Hyowon, Waley Liang, DongSub Choi, Nakyoon Kim, Jeongpyo Lee, Pandev, Stilian, Sanghuck Jeon, Robinson, John C.
Publikováno v:
Proceedings of SPIE; 2018, Vol. 10585, p1-9, 9p