Zobrazeno 1 - 10
of 17
pro vyhledávání: '"Joe Sumakeris"'
Autor:
Robert Tyler Leonard, Yu Yang, Fangzhen Wu, Ouloide Yannick Goue, Balaji Raghothamachar, Joe Sumakeris, Jianqiu Guo, Michael Dudley
Publikováno v:
Journal of Crystal Growth. 452:39-43
Synchrotron X-ray Topography is a powerful technique to study defects structures particularly dislocation configurations in single crystals. Complementing this technique with geometrical and contrast analysis can enhance the efficiency of quantitativ
Autor:
Michael Dudley, Joe Sumakeris, Fangzhen Wu, Ouloide Yannick Goue, Balaji Raghothamachar, Robert Tyler Leonard, Yu Yang, Jianqiu Guo
Publikováno v:
Journal of Electronic Materials. 45:2045-2050
In addition to pure threading screw dislocations (TSDs), the presence of threading mixed dislocations (TMDs) (with a component) has been reported both in 4H-SiC axial slices (wafers cut parallel to the growth axis) and in commercial offcut wafers (cu
Autor:
Vipindas Pala, Daniel J. Lichtenwalner, Brett Hull, A. Burk, Joe Sumakeris, Edward Van Brunt, S.T. Allen, Sei-Hyung Ryu, Michael J. O'Loughlin, John W. Palmour
Publikováno v:
MRS Advances. 1:81-89
Due to the wide bandgap and other key materials properties of 4H-SiC, SiC MOSFETs offer performance advantages over competing Si-based power devices. For example, SiC can more easily be used to fabricate MOSFETs with very high voltage ratings, and wi
Publikováno v:
International Journal of High Speed Electronics and Systems. 14:860-864
The path to commercializing a 4H - SiC power PiN diode has faced many difficult challenges. In this work, we report a 50 A, 10 kV 4H - SiC PiN diode technology where good crystalline quality and high carrier lifetime of the material has enabled a hig
Publikováno v:
Journal of Electronic Materials. 26:151-159
Synchrotron white beam x-ray topography (SWBXT) and Nomarski optical microscopy (NOM) have been used to characterize 4H-SiC epilayers and to study the character of triangular inclusions therein. 4H-SiC substrates misoriented by a range of angles from
Publikováno v:
Proceedings. IEEE Lester Eastman Conference on High Performance Devices, 2004..
The path to commercializing a 4H-SiC power PiN diode has faced many difficult challenges. In this work, we report a 50 A, 10 kV 4H-SiC PiN diode technology where good crystalline quality and high carrier lifetime of the material has enabled a high yi
The primary focus of the research for this grant has been the atomic layer epitaxy (ALE) of Si; however, the ALE of SiC has also received serious consideration. A Computer assisted study, based on the free energy minimization of a thermodynamic syste
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d5b106a82a7561a90a850c4ccb392f70
https://doi.org/10.21236/ada231348
https://doi.org/10.21236/ada231348
Autor:
Guo, Jianqiu, Yang, Yu, Wu, Fangzhen, Sumakeris, Joe, Leonard, Robert, Goue, Ouloide, Raghothamachar, Balaji, Dudley, Michael
Publikováno v:
Journal of Electronic Materials; Apr2016, Vol. 45 Issue 4, p2045-2050, 6p, 1 Black and White Photograph, 5 Diagrams, 2 Charts, 1 Graph
Publikováno v:
2013 Twenty-Eighth Annual IEEE Applied Power Electronics Conference & Exposition (APEC); 2013, p540-544, 5p
Publikováno v:
IEEE Journal of Quantum Electronics; Oct2005, Vol. 41 Issue 10, p1213-1216, 4p