Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Joe Jech"'
Autor:
Kim Dae Ho, Ya Shen, David M. Aichele, Ramakrishna Vetury, Mary Winters, Joe Jech, Shawn R. Gibb, Michael A. McLain, Michael D. Hodge, Ken Fallon, Jeffrey B. Shealy, Houlden Rohan W, Pinal Patel
Publikováno v:
2017 IEEE International Electron Devices Meeting (IEDM).
5.24GHz bulk acoustic wave filters, utilizing undoped single crystal aluminum nitride, are reported. The filters had an absolute 4dB bandwidth of 151 MHz, a minimum insertion loss of 2.82 dB and rejection >38 dB. Resonators show k2 eff of 6.32%, Q rn
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ec859e42e99caac32cf3db1d71d32c41
https://doi.org/10.1109/iedm.2017.8268460
https://doi.org/10.1109/iedm.2017.8268460
Autor:
Joe Jech, Medhat A. Toukhy
Publikováno v:
SPIE Proceedings.
HX-256 resist is formulated to exhibit superior image stability at elevated temperatures. This allows the resist to be used in high temperature environment processes such as ion implantation and plasma etching. A standard post-bake at 130°C. is requ
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3e6ae1283360b5d1e67f2e617f6c4754
https://doi.org/10.1117/12.941790
https://doi.org/10.1117/12.941790