Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Jochen Vieker"'
Publikováno v:
Extreme Ultraviolet Lithography 2020.
Fraunhofer ILT has been developing EUV sources for more than 2 decades and has been developing multitude of EUV applications in collaboration with RWTH Aachen University, e.g., EUV laboratory-scale lithography for patterning and resist testing with d
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f565fe9ff587fe17b429b57cf991fd9f
https://doi.org/10.1117/12.2573152
https://doi.org/10.1117/12.2573152
Autor:
Klaus Bergmann, Jochen Vieker
Reliability and a long maintenance interval are major requirements for the industrial use of an extreme ultraviolet (EUV) source. In this paper we present results on the influence of the electrode erosion on the EUV generation and its lifetime limiti
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::cc5a72593db0078dd26219aac87d19cb
https://publica.fraunhofer.de/handle/publica/249406
https://publica.fraunhofer.de/handle/publica/249406
A new concept of a discharge based extreme ultraviolet radiation source is presented. This concept is based on an electrode system that consists of two consecutive pseudospark discharge stages. The first stage is used to create a pinch plasma as emit
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::36a20a869c1b0a48c0b5ffddb7ed9906
https://publica.fraunhofer.de/handle/publica/246029
https://publica.fraunhofer.de/handle/publica/246029
Autor:
Jochen Vieker, Klaus Bergmann
Publikováno v:
Journal of Physics D: Applied Physics; 8/31/2017, Vol. 50 Issue 34, p1-1, 1p