Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Jo Alvin Dumaya"'
Publikováno v:
SPIE Proceedings.
Critical dimensions (CD) measured in resist are key to understanding the CD distribution on photomasks. Vital to this understanding is the separation of spatially random and systematic contributions to the CD distribution. Random contributions will n
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2f5ac33260d8550001ac4df83ea8d436
https://doi.org/10.1117/12.896416
https://doi.org/10.1117/12.896416
Autor:
C. S. Mah, T. Onoue, J. Z. Shi, C. Y. Ong, Jo Alvin Dumaya, S. Ishibashi, S. N. Piramanayagam
Publikováno v:
Journal of Applied Physics. 101:103914
The role of substrate bias during the sputter deposition of various layers of double-layered CoCrPt−SiO2 perpendicular recording media has been investigated in order to understand the physical mechanisms behind the various effects observed. Perpend
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7e8446ed75ced821d1da508617b1a087
https://doi.org/10.1063/1.2735398
https://doi.org/10.1063/1.2735398