Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Jisoong Park"'
Autor:
Jisoong Park, So-Eun Shin, Sukho Lee, So Goto, Jungwook Shon, Dai Tsunoda, Nobuyasu Takahashi
Publikováno v:
SPIE Proceedings.
Demand for mask process correction (MPC) is growing facing the 14nm era. We have developed model based MPC and can generate mask contours by using this mask process model. This mask process model consists of EB (development) and etch, which employs a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2e57dde4bcf0493d7f79290856b7614d
https://doi.org/10.1117/12.2196713
https://doi.org/10.1117/12.2196713
Autor:
Byung-Gook Kim, Chan-Uk Jeon, Jisoong Park, Sterling Watson, Bob Pack, Ingo Bork, Jin Choi, Anthony Adamov
Publikováno v:
SPIE Proceedings.
Model-Based Mask Data Preparation (MB-MDP) has been discussed in the literature for its benefits in reducing mask write times [1][2]. By being model based (i.e., simulation based), overlapping shots, per-shot dose modulation, and circular and other c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b96c7ea7541f051194195f08fb04e1a4
https://doi.org/10.1117/12.966327
https://doi.org/10.1117/12.966327