Zobrazeno 1 - 10
of 299
pro vyhledávání: '"Jisheng PAN"'
Autor:
Bingyang He, Zhiqiao Yan, Tingwei Liu, Zhicheng Wei, Qiusheng Yan, Zhijun Chen, Jisheng Pan, Zhengyang Liu, Juan Wang, Feng Chen
Publikováno v:
Journal of Materials Research and Technology, Vol 32, Iss , Pp 2063-2075 (2024)
Magnetorheological finishing (MRF) is one of the candidate technologies for the efficient polishing of single crystal silicon carbide (SiC). It is of great importance to improve the efficiency of MRF and reduce the costs by improving the catalytic ac
Externí odkaz:
https://doaj.org/article/57bde62da845477f89af76f0d194f728
Autor:
Zejun Sun, Jinlin Yang, Hongfei Xu, Chonglai Jiang, Yuxiang Niu, Xu Lian, Yuan Liu, Ruiqi Su, Dayu Liu, Yu Long, Meng Wang, Jingyu Mao, Haotian Yang, Baihua Cui, Yukun Xiao, Ganwen Chen, Qi Zhang, Zhenxiang Xing, Jisheng Pan, Gang Wu, Wei Chen
Publikováno v:
Nano-Micro Letters, Vol 16, Iss 1, Pp 1-17 (2024)
Highlights Cetyltrimethylammonium cations can shield the repelling force on anions to attract more anions into electric double layer region during lithium plating process, facilitating the formation of inorganic-rich solid-state electrolyte interphas
Externí odkaz:
https://doaj.org/article/5e61f208aebd4b09b7015faed35c686f
Van der Waals enabled formation and integration of ultrathin high-κ dielectrics on 2D semiconductors
Autor:
Matej Sebek, Zeng Wang, Norton Glen West, Ming Yang, Darren Chi Jin Neo, Xiaodi Su, Shijie Wang, Jisheng Pan, Nguyen Thi Kim Thanh, Jinghua Teng
Publikováno v:
npj 2D Materials and Applications, Vol 8, Iss 1, Pp 1-9 (2024)
Abstract A thin dielectric layer is an important constituent element in 2D materials-based electronics and photonics. Current methods of using hexagonal boron nitride (hBN) and direct deposition of dielectric layer induce either high leakage current
Externí odkaz:
https://doaj.org/article/ef4d7594c00b4e8085ef9242918265f5
Publikováno v:
Jin'gangshi yu moliao moju gongcheng, Vol 43, Iss 6, Pp 684-692 (2023)
A new lapping process is proposed for high efficiency and low surface roughness lapping of hard-brittle materials such as sapphire, which sinters single crystal diamond abrasive (average grain size 3 μm) with vitrified bond into agglomerated abrasiv
Externí odkaz:
https://doaj.org/article/4b640ad1ab1d40b395b91608ac69664d
Fenton reaction chemical mechanical polishing liquid composition optimization of polishing GaN wafer
Publikováno v:
Jin'gangshi yu moliao moju gongcheng, Vol 42, Iss 5, Pp 610-616 (2022)
Aiming at the polishing liquid used for polishing GaN wafers by Fenton reaction CMP, a parameter optimization experiment was carried out with the surface quality as the evaluation index, and the optimal ratio of the polishing liquid components was fo
Externí odkaz:
https://doaj.org/article/da3abc46ace64e9b9f8378d2e3cf5a5b
Publikováno v:
Jin'gangshi yu moliao moju gongcheng, Vol 42, Iss 4, Pp 488-494 (2022)
In order to improve the magnetorheological polishing efficiency of photoelectric wafer and realize its ultra smooth planarization, the magnetorheological variable gap dynamic pressure planarization method is proposed. The changes of material removal
Externí odkaz:
https://doaj.org/article/1e5c929907ef42ce9e17a7a36d268bd6
Autor:
Ahmed Elbanna, Ksenia Chaykun, Yulia Lekina, Yuanda Liu, Benny Febriansyah, Shuzhou Li, Jisheng Pan, Ze Xiang Shen, Jinghua Teng
Publikováno v:
Opto-Electronic Science, Vol 1, Iss 8, Pp 1-40 (2022)
Transition metal dichalcogenides (TMDs) and perovskites are among the most attractive and widely investigated semiconductors in the recent decade. They are promising materials for various applications, such as photodetection, solar energy harvesting,
Externí odkaz:
https://doaj.org/article/9996b0f0f7644fbaaedf0716ab43874f
Autor:
Zheng Zhang, Tzee Luai Meng, Coryl Jing Jun Lee, Fengxia Wei, Te Ba, Zhi-Qian Zhang, Jisheng Pan
Publikováno v:
Materials, Vol 16, Iss 15, p 5240 (2023)
Cold spray (CS) is an emerging technology for repairing and 3D additive manufacturing of a variety of metallic components using deformable metal powders. In CS deposition, gas type, gas pressure, gas temperature, and powder feed rate are the four key
Externí odkaz:
https://doaj.org/article/fbecb599f2a7486499fea65659b58a1d
Autor:
Yuanlong Liang, Xianjun Huang, Kui Wen, Zhaofeng Wu, Lixiang Yao, Jisheng Pan, Wencong Liu, Peiguo Liu
Publikováno v:
Applied Sciences, Vol 13, Iss 8, p 4846 (2023)
Metal mesh films have been shown to be a promising strategy to effectively mitigate the growing issue of electromagnetic interference (EMI) in optoelectronic systems. To achieve superior shielding effectiveness, it is common to increase the thickness
Externí odkaz:
https://doaj.org/article/4180c621b3954161aeaf8cd711ab56b6
Publikováno v:
Nanoscale Research Letters, Vol 16, Iss 1, Pp 1-9 (2021)
Abstract We analyzed the dry etching of perovskite oxides using argon-based inductively coupled plasmas (ICP) for photonics applications. Various chamber conditions and their effects on etching rates have been demonstrated based on Z-cut lithium niob
Externí odkaz:
https://doaj.org/article/aedd460de5874480a6d731a9a1a487e0