Zobrazeno 1 - 10
of 14
pro vyhledávání: '"Jinxiong Li"'
Autor:
Yuqing Zhang, Jiye Li, Jinxiong Li, Tengyan Huang, Yuhang Guan, Yuhan Zhang, Huan Yang, Mansun Chan, Xinwei Wang, Lei Lu, Shengdong Zhang
Publikováno v:
Advanced Electronic Materials, Vol 9, Iss 8, Pp n/a-n/a (2023)
Abstract The capacitor–less embedded dynamic random access memory (eDRAM) based on oxide semiconductor (OS) transistors exhibits a promising future and thus has lead to a growing demand for nanoscale OS thin–film transistors (TFTs). In this work,
Externí odkaz:
https://doaj.org/article/e6dae85452894ecd8e90341de5af25e2
Publikováno v:
International Journal of Extreme Manufacturing, Vol 5, Iss 3, p 032003 (2023)
Atomic layer deposition (ALD) has become an indispensable thin-film technology in the contemporary microelectronics industry. The unique self-limited layer-by-layer growth feature of ALD has outstood this technology to deposit highly uniform conforma
Externí odkaz:
https://doaj.org/article/289c68e68ed04549979d339a00158471
Autor:
Yuqing Zhang, Jiye Li, Jinxiong Li, Tengyan Huang, Yuhang Guan, Yuhan Zhang, Huan Yang, Mansun Chan, Xinwei Wang, Lei Lu, Shengdong Zhang
Publikováno v:
IEEE Electron Device Letters. 44:444-447
Publikováno v:
Nankai Business Review International. 14:102-127
Purpose In recent years, the application of artificial intelligence and digital technology has increasingly become a priority for online retailers. It is crucial to choose a way to make use of human–computer interaction (HCI) design to exert the po
Autor:
Yuhang Guan, Yuqing Zhang, Jinxiong Li, Jiye Li, Yuhan Zhang, Zhenhui Wang, Yuancan Ding, Mansun Chan, Xinwei Wang, Lei Lu, Shengdong Zhang
Publikováno v:
Applied Surface Science. 625:157177
Autor:
Jiye Li, Yuhang Guan, Jinxiong Li, Yuqing Zhang, Yuhan Zhang, ManSun Chan, Xinwei Wang, Lei Lu, Shengdong Zhang
Publikováno v:
Nanotechnology. 34:265202
To strengthen the downscaling potential of top-gate amorphous oxide semiconductor (AOS) thin-film transistors (TFTs), the ultra-thin gate insulator (GI) was comparatively implemented using the atomic-layer-deposited (ALD) AlO x and HfO x . Both kinds
Autor:
Yubo Zhao, Pucheng Chen, Yuzhen Hu, Jing Liu, Yongping Jiang, Xianying Zeng, Guohua Deng, Jianzhong Shi, Yanbing Li, Guobin Tian, Jinxiong Liu, Hualan Chen
Publikováno v:
Emerging Microbes and Infections, Vol 13, Iss 1 (2024)
Due to the fact that many avian influenza viruses that kill chickens are not lethal to ducks, farmers are reluctant to use avian influenza inactivated vaccines on ducks. Large numbers of unvaccinated ducks play an important role in the transmission o
Externí odkaz:
https://doaj.org/article/ac5794bb241b4ad4a111ed1e15a37193
Publikováno v:
Nanotechnology. 34:245708
Atomic layer deposition (ALD) has become an essential technology in many areas. To better develop and use this technology, it is of the pivot to understand the surface chemistry during the ALD film growth. The growth of an ALD oxide film may also ind
Publikováno v:
Applied Sciences, Vol 14, Iss 15, p 6486 (2024)
Due to the large-scale integration of renewable energy and the rapid growth of peak load demand, it is necessary to comprehensively consider the construction of various resources to increase the acceptance capacity of renewable energy and meet power
Externí odkaz:
https://doaj.org/article/e0eea3b4f60a49e0ad48884d184a99d4
Autor:
Qiannan Ye, Jinxiong Li, Xiuhua Cao, Jiangxia Huang, Honglong Ning, Xianzhe Liu, Zhang Xu, Shuang Wang, Junbiao Peng, Rihui Yao, Danqing Hou
Publikováno v:
Superlattices and Microstructures. 139:106400
SnOx films were prepared by sol-gel spin coating technology on glass substrates at low temperature. Through the optimization of the solution process, the quality of the film was effectively improved. And the effects of rotating speed, substrate pretr