Zobrazeno 1 - 10
of 24
pro vyhledávání: '"Jinok Moon"'
Publikováno v:
Materials & Design, Vol 241, Iss , Pp 112935- (2024)
We would like to respond to “Comments on Seo et al., Materials & Design 117 (2017) 131–138, https://doi.org/10.1016/j.matdes.2016.12.066″. Mangindaan et al. raised concerns about deriving the 2nd order equations for optimizing the W-pattern CMP
Externí odkaz:
https://doaj.org/article/3d5ef29236004582b176d35218f2dc2d
Autor:
Taesung Kim, Charles Kim, Dukmin Ahn, Seokjun Hong, Hyeon Joon Han, Jinok Moon, Yongmok Kim, Hunhee Lee
Publikováno v:
Solid State Phenomena. 314:214-217
Sulfuric Peroxide Mixture (SPM, H2SO4 + H2O2) has been widely used in semiconductor manufacturing processes due to its high reactivity and attractive price. However, SPM releases SO42- ions that can be high impact on the environmental contaminations.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::975c2bfff1cae9372890f3df7611e635
https://doi.org/10.4028/www.scientific.net/ssp.314.214
https://doi.org/10.4028/www.scientific.net/ssp.314.214
Autor:
Myeongjae Lee, Sounghyun So, Jinok Moon, Kijung Kim, Sungwook Cho, Kangchun Lee, Keungtae You, Taeseup Song
Publikováno v:
ECS Journal of Solid State Science and Technology. 7:P91-P95
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ec75fc602fb225fc26be4af2c28a953c
https://doi.org/10.1149/2.0131803jss
https://doi.org/10.1149/2.0131803jss
Publikováno v:
Journal of Materials Research. 32:2829-2836
Ce3+ ions in ceria nanoparticles (NPs) play a role as reactive sites in the adsorption of silicate anions. However, the limited concentration of Ce3+ ions in ceria NPs remains a major challenge in this regard. Herein, we report a simple strategy to s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b4fb463ec7ac605bbe58512d3822334a
https://doi.org/10.1557/jmr.2017.189
https://doi.org/10.1557/jmr.2017.189
Publikováno v:
Materials & Design, Vol 117, Iss, Pp 131-138 (2017)
In this study, a response surface methodology (RSM) coupled with a face center cube design (FCD) was used to optimize the three principal components (i.e., Fe(NO3)3, H2O2, and SiO2 abrasives) in polishing slurries for a W barrier chemical mechanical
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::90954aa830508266e088d69ff49b8e97
http://www.sciencedirect.com/science/article/pii/S0264127516315933
http://www.sciencedirect.com/science/article/pii/S0264127516315933
Publikováno v:
ECS Journal of Solid State Science and Technology. 6:P405-P409
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::de1244f548f3f5c4870f8bfc4181e277
https://doi.org/10.1149/2.0171707jss
https://doi.org/10.1149/2.0171707jss
Autor:
Taeseup Song, Jinok Moon, Sounghyun So, Keungtae You, Kangchun Lee, Myeongjae Lee, Kijung Kim, Sungwook Cho
Publikováno v:
ECS Journal of Solid State Science and Technology. 7:P132-P134
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::511b9241f6aa43245e8f5557d36d8803
https://doi.org/10.1149/2.0251803jss
https://doi.org/10.1149/2.0251803jss
Autor:
Jinok Moon, Dong Kee Yi, Heesung Yoon, Joo Hyun Kim, Jihoon Seo, Kangchun Lee, J. S. Hwang, Ungyu Paik
Publikováno v:
Applied Surface Science. 389:311-315
In this study, we have investigated the role of the Ce oxidation state (Ce3+/Ce4+) on the CeO2 surfaces for silicate adsorption. In aqueous medium, the Ce3+ sites lead to the formation of −OH groups at the CeO2 surface through H2O dissociation. Sil
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c82040dd8756120668a11e0619a7fbdf
https://doi.org/10.1016/j.apsusc.2016.06.193
https://doi.org/10.1016/j.apsusc.2016.06.193
Publikováno v:
ECS Journal of Solid State Science and Technology. 6:P169-P171
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::11814b6c247389d3a5a0333e89f21dec
https://doi.org/10.1149/2.0311704jss
https://doi.org/10.1149/2.0311704jss
Publikováno v:
Applied Surface Science. 353:499-503
Although poly(acrylic acid) (PAA) has been used as a passivation agent for high polish rate selectivity between SiO 2 and Si 3 N 4 in STI CMP, it causes severe dishing during the over-polishing step. Here, we fabricated interpolymer complexes of PAA
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e077c28557b24b206a032abd1485826b
https://doi.org/10.1016/j.apsusc.2015.06.078
https://doi.org/10.1016/j.apsusc.2015.06.078