Zobrazeno 1 - 10
of 12
pro vyhledávání: '"Jing Yi Chin"'
Publikováno v:
Journal of Environmental Management. 343:118231
Graphitic carbon nitride photocatalyst for the degradation of oxytetracycline hydrochloride in water
Publikováno v:
Materials Chemistry and Physics. 301:127626
Publikováno v:
Journal of Polymer Research. 29
Publikováno v:
Journal of Water Process Engineering. 51:103342
Publikováno v:
Water science and technology : a journal of the International Association on Water Pollution Research. 82(12)
Membrane distillation (MD) is an advantageous separation process compared with pressure-driven technologies and was subsequently introduced to treat aquaculture wastewater. Harnessing a superhydrophobic membrane in an MD process is of extreme importa
Publikováno v:
Journal of Water Process Engineering. 46:102553
Publikováno v:
Science of The Total Environment. 794:148657
Surging growth of aquaculture industry has alarmed the public when the wastewater discharged had an adverse effect on the environment. This current study is a pioneer in the use of membrane distillation (MD) to treat real aquaculture wastewater. In a
Autor:
Siew Chun Low, Jing Yi Chin, Boon S. Ooi, Zeinab Abbas Jawad, Guang Hui Teoh, Hui Ting Lyly Leow
Publikováno v:
Journal of Water Process Engineering. 37:101528
Preparation of membrane with lotus leaf-like surface is extremely important in direct contact membrane distillation (MD), to restrict invasion of the liquid into the membrane pores and consequently reducing membrane wettability. In this work, superhy
Autor:
Jing Yi Chin, Hsing-Hua Wu, Ting-Chang Chang, Yung-Chun Wu, Yi Chan Chen, Chun-Yen Chang, Shih Ching Chen, Yong En Syu, S. M. Sze
Publikováno v:
Thin Solid Films. 518:3999-4002
This study investigates the temperature-dependent memory characteristics of polycrystalline silicon thin-film transistors with oxide/nitride/oxide stack gate dielectrics and N+ poly-Si gate structures for nonvolatile memory application. As the device
Autor:
Shih Cheng Chen, Chun-Yen Chang, S. M. Sze, Shih Ching Chen, Po-Tsun Liu, Jing Yi Chin, Chenhsin Lien, Ting-Chang Chang, Yung-Chun Wu, Po Shun Lin
Publikováno v:
Surface and Coatings Technology. 202:1287-1291
In this work, we study a polycrystalline silicon thin-film transistor (poly-Si TFT) combined with a silicon–oxide–nitride–oxide–silicon (SONOS) stack gate dielectric and nanowire channels structure for the applications of transistor and nonvo