Zobrazeno 1 - 10
of 24
pro vyhledávání: '"Jin Wuk Sung"'
Autor:
Cong Liu, Vipul Jain, Iou-Sheng Ke, Amy Kwok, James Park, Janet Wu, Jin Wuk Sung, Mingqi Li, Jong Keun Park, Joshua A. Kaitz
Publikováno v:
Advances in Patterning Materials and Processes XXXVI.
Miniaturization of lithographic feature sizes via shrink technologies is under development in order to extend 193nm immersion lithographic capabilities and achieve sub-20nm critical dimensions (CD) in integrated circuit manufacturing before extreme u
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8050f6c3d7a0e3f4c23af9e6bdbc748f
https://doi.org/10.1117/12.2518366
https://doi.org/10.1117/12.2518366
Publikováno v:
Journal of Photopolymer Science and Technology. 29:753-760
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::587a771489de0313330c39593eb52e98
https://doi.org/10.2494/photopolymer.29.753
https://doi.org/10.2494/photopolymer.29.753
Autor:
Kaitz, Joshua, Janet Wu, Jain, Vipul, Iou-Sheng Ke, Mingqi Li, Kwok, Amy, Park, James, Jong Park, Jin Wuk Sung, Cong Liu
Publikováno v:
Proceedings of SPIE; 1/23/2019, Vol. 10960, p1-9, 9p
Autor:
Michael Wagner, Paul J. LaBeaume, James W. Thackeray, James F. Cameron, Jin Wuk Sung, Matthew D. Christianson, Su-Jin Kang, Vipul Jain, Daniel J. Arriola, Suzanne Coley
Publikováno v:
Journal of Photopolymer Science and Technology. 24:179-183
This paper discusses the continued evolution of Polymer-bound PAG [PBP] resists for sub-20nm lithography. Utilizing EUV wavelength, there has been enough progress in resolution and sensitivity to justify the use of these materials. PBP resists have s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::38ce8021330265ba1f84a5d9032edb99
https://doi.org/10.2494/photopolymer.24.179
https://doi.org/10.2494/photopolymer.24.179
Autor:
James F. Cameron, Irene Popova, Kevin O'Shea, Hiroaki Kitaguchi, David Valeri, John P. Amara, Yoshihiro Yamamoto, Jin Wuk Sung, Pushkara Rao Varanashi, Libor Vyklicky, Adam Ware
Publikováno v:
Journal of Photopolymer Science and Technology. 23:721-729
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::76baf3284a18de2e05b58b63122159b1
https://doi.org/10.2494/photopolymer.23.721
https://doi.org/10.2494/photopolymer.23.721
Autor:
Kevin O'Shea, Yoshihiro Yamamoto, Jin Wuk Sung, Libor Vyklicky, Pushkara Rao Varanasi, George G. Barclay, Irene Popova, James F. Cameron, Jason A. DeSISTO, Manabu Hidano, Johan Amara, David Valeri, Vaishali R. Vohra, Greg Prokopowicz, Adam Ware, Tomoki Kurihara, Kathleen M. O'Connell, Wu-Song Huang
Publikováno v:
Journal of Photopolymer Science and Technology. 22:17-24
A new family of materials has been developed to serve as a wet-developable bottom antireflective coating (D-BARC) for patterning levels that have a strong need to avoid dry-etch processes for BARC-open steps. Such include some implant levels, where d
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::82c1c025ab30f31631633756506e17c2
https://doi.org/10.2494/photopolymer.22.17
https://doi.org/10.2494/photopolymer.22.17
Publikováno v:
Synthetic Communications. 31:2613-2617
2-Alkyl-3-phosphoryl chromanones and its thio-derivatives were synthesized by a tandem allyl-vinyl migration and cyclization of α-(o-hydroxybenzoyl)-allylic phosphonates which were readily produced from lithiated allylic phosphonates and salicylate.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bc0136fd070f3e58998672ff06a5296a
https://doi.org/10.1081/scc-100105386
https://doi.org/10.1081/scc-100105386
Publikováno v:
Synthetic Communications. 27:3171-3174
1-Alkynylphosphonates 3 are prepared in a one-pot procedure from diethyl phosphorochloridates 2 and alkynyllithiums 1, which are readily generated by the reaction of 1-alkynes with n-BuLi.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b22da8ccf372c42587f5b0a10c5a617a
https://doi.org/10.1080/00397919708004175
https://doi.org/10.1080/00397919708004175
Publikováno v:
Tetrahedron Letters. 37:7537-7540
Hydrozirconation of acetylenic tellurides 1 affords the first examples of 1,1-bimetalloalkenes of tellurium and zirconium 2. Intermediates 2 are reacted with acyl halides to obtain (Z)-α-organotelluro- α,β-unsaturated carbonyl compounds 4 via Zr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::34441334e67754b18c3e8945d438ab18
https://doi.org/10.1016/0040-4039(96)01711-x
https://doi.org/10.1016/0040-4039(96)01711-x
Autor:
David Valeri, Owendi Ongayi, Michael Wagner, Marie Hellion, Claire Sourd, James F. Cameron, Vipul Jain, Paul J. LaBeaume, B. Icard, Amy Kwok, Bernard Dalzotto, Jin Wuk Sung, Laurent Pain, Suzanne Coley, Jim Thackeray
Publikováno v:
SPIE Proceedings.
Prompted by the fact that the International Technology Roadmap for Semiconductors (ITRS) has declared no proven optical solutions are available for sub 22nm hp patterning, we have investigated e-Beam and Extreme Ultraviolet (EUV) resist performance w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::624ef28d36e0dfb347365975357fdffb
https://doi.org/10.1117/12.916598
https://doi.org/10.1117/12.916598