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Publikováno v:
Japanese Journal of Applied Physics. 47:5320-5323
The effect of passivation layers (SiOX, SiNX, etc.) using plasma-enhanced chemical vapor deposition (PECVD) for crystalline silicon solar cells showed high surface recombination with decreasing of deposition temperature (
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bff66f5011fb8d3d2ee531f72addcffb
https://doi.org/10.1143/jjap.47.5320
https://doi.org/10.1143/jjap.47.5320
