Zobrazeno 1 - 10
of 16
pro vyhledávání: '"Jin Jung Chen"'
Publikováno v:
Neurobiology of Disease, Vol 18, Iss 3, Pp 476-483 (2005)
Astroglial glutamate transporters, GLT-1 and GLAST, play an essential role in removing released glutamate from the extracellular space and are essential for maintaining a low concentration of extracellular glutamate in the brain. It was hypothesized
Externí odkaz:
https://doaj.org/article/5d3b20eb5f824e488a8a56e8bbaa63c9
Autor:
Ruey-Shan Guo1 rsguo@ccms.ntu.edu.tw, Jin-Jung Chen2
Publikováno v:
IIE Transactions. Jun2002, Vol. 34 Issue 6, p573. 10p. 4 Diagrams, 2 Charts, 8 Graphs.
Publikováno v:
Neurobiology of Disease, Vol 18, Iss 3, Pp 476-483 (2005)
Astroglial glutamate transporters, GLT-1 and GLAST, play an essential role in removing released glutamate from the extracellular space and are essential for maintaining a low concentration of extracellular glutamate in the brain. It was hypothesized
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0b886a0cb5ff30fc06333b86ec55d5cb
https://doi.org/10.1016/j.nbd.2004.12.011
https://doi.org/10.1016/j.nbd.2004.12.011
Publikováno v:
Chemistry of Natural Compounds. 49:777-779
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3b434449472283ff3308d2403110552a
https://doi.org/10.1007/s10600-013-0742-6
https://doi.org/10.1007/s10600-013-0742-6
Publikováno v:
Journal of the Chinese Institute of Engineers. 22:627-638
In this paper a self‐tuning run‐by‐run process controller is presented. The controller has the capability of choosing a control parameter dynamically in response to the underlying process disturbances. There are two modules in this controller:
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e411a49e5b0d3f8bd101445c1ae10b6c
https://doi.org/10.1080/02533839.1999.9670499
https://doi.org/10.1080/02533839.1999.9670499
Publikováno v:
Chemistrybiodiversity. 5(7)
A new indole alkaloid, 11,12-dimethoxyhenningsamine (1), was isolated from the roots of Strychnos cathayensis, together with 19 known compounds. The structure of this new compound was determined through spectroscopic and mass-spectrometric analyses.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a5b5baaf110077afe6cb554a3ec64098
https://pubmed.ncbi.nlm.nih.gov/18649301
https://pubmed.ncbi.nlm.nih.gov/18649301
Autor:
Jin-Jung Chen, 陳瑾蓉
92
The appearance of Internet has contributed to rapid growth of both surfer population and business applications. Under the impact, the new consumption trend of online bidding is growing rapidly. Besides, under the severe competition, it gets m
The appearance of Internet has contributed to rapid growth of both surfer population and business applications. Under the impact, the new consumption trend of online bidding is growing rapidly. Besides, under the severe competition, it gets m
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/fxy6y9
Publikováno v:
1997 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat. No.97CH36023).
In this paper, we present a cost-effective methodology for a run-by-run EWMA controller. This controller is an integrated approach that combines the advantages of statistical process control and feedback control. It adjusts the equipment settings onl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4f48325b1137c0cb93b7e7d6eec42b30
https://doi.org/10.1109/issm.1997.664624
https://doi.org/10.1109/issm.1997.664624
Publikováno v:
2000 Semiconductor Manufacturing Technology Workshop (Cat. No.00EX406).
During IC fabrication, the chemical-mechanical polishing (CMP) process usually suffers from a drift in the run-to-run removal rate due to the wear of the polishing pad. In this paper, two run-to-run control schemes, the predictor corrector control (P
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fcca4ab636136c14478bb748b858bd0b
https://doi.org/10.1109/smtw.2000.883103
https://doi.org/10.1109/smtw.2000.883103
Autor:
Jin-Jung Chen, 陳進忠
88
Semiconductor manufacturing processes are subject to small and large special disturbances such as process drifts or shifts. In many cases the causes of disturbances are known, but it is either impossible or too expensive to remove them. In ca
Semiconductor manufacturing processes are subject to small and large special disturbances such as process drifts or shifts. In many cases the causes of disturbances are known, but it is either impossible or too expensive to remove them. In ca
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/93927416344894001095