Zobrazeno 1 - 2
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pro vyhledávání: '"Jim Manka"'
Autor:
Jeffrey A Schefske, Anna Minvielle, Lovejeet Singh, Terry Manchester, David Tien, Joerg Reiss, John C. Robinson, Kelly O'Brien, Eric Kent, Jim Manka, Brad Eichelberger
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXIII.
Overlay control is gaining more attention in recent years as technology moves into the 32nm era. Strict overlay requirements are being driven not only by the process node but also the process techniques required to meet the design requirements. Doubl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2a9446ae0e9fd551c5d86dd5b55aeb16
https://doi.org/10.1117/12.814256
https://doi.org/10.1117/12.814256
Publikováno v:
SPIE Proceedings.
Overlay metrology and control have been critical for successful advanced microlithography for many years, and are taking on an even more important role as time goes on. Due to throughput constraints it is necessary to sample only a small subset of ov
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::51a7c933455bf5ea85c4fac8e652eab8
https://doi.org/10.1117/12.772738
https://doi.org/10.1117/12.772738