Zobrazeno 1 - 10
of 20
pro vyhledávání: '"Jim Dewitt"'
Autor:
Suhas Pillai, Jun Yashima, Aki Fujimura, Thang Nguyen, Ajay Baranwal, Noriaki Nakayamada, Jim Dewitt
Publikováno v:
Photomask Technology 2021.
The two standard reticle defect inspection methods are die-to-die and die-to-database. The die-to-die inspection method compares images from the two dice on the same reticle to identify any defect. However, the die-to-database inspection method compa
Autor:
Ajay K. Baranwal, Suhas Pillai, Thang Nguyen, Jun Yashima, Jim Dewitt, Noriaki Nakayamada, Mikael Wahlsten, Aki Fujimura
Publikováno v:
Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology.
Autor:
Aki Fujimura, Noriaki Nakayamada, Ajay Baranwal, Jim Dewitt, Mikael L. Wahlsten, Thang Nguyen, Suhas Pillai, Jun Yashima
Publikováno v:
Photomask Technology 2020.
Sub-nanometer accuracy attainable with electron micrograph SEM images is the only way to “see” well enough for the mask analysis needed in EUV mask production. Because SEM images are pixel dose maps, deep learning (DL) offers an attractive altern
Autor:
Jim DeWitt Isaak
Publikováno v:
Proceedings of the IEEE. 101:1810-1812
Publikováno v:
Journal of Physical Education, Recreation & Dance. 68:49-52
(1997). Swim Test Requirements at Four-Year Universities in the United States. Journal of Physical Education, Recreation & Dance: Vol. 68, No. 2, pp. 49-52.
Publikováno v:
Journal of Physical Education, Recreation & Dance. 63:73-79
Rock climbing is a vigorous activity that requires a unique combination of strength and power balanced with endurance and flexibility. In the mind of a dedicated rock climber, developing and maintaining an adequate level of fitness is as important as
Autor:
Tom Roberts, Jim Dewitt
Publikováno v:
Journal of Physical Education, Recreation & Dance. 62:67-71
Publikováno v:
SPIE Proceedings.
Multiphase printing (MPPTM) has been shown to improve registration and CD performance by reducing butting errors, averaging scan linearity errors and improving stripe boundary CD performance. In the MEBES 4500, improvements in the data path allow MPP
Autor:
Robert J. Naber, William Wang, Michael D. Lubin, Leonard Gasiorek, Jim DeWitt, Joe Watson, Keith Wires, Thomas P. Coleman
Publikováno v:
SPIE Proceedings.
It has been shown that mask composite pattern position errors can be reduced by more than 40% on the MEBES 4000 system if a reference grid is used to match a MEBES 4000 system to an independent metrology tool. It has also been shown that matching bet
Autor:
David W. Alexander, Mark Mayse, Allen Cook, Jim DeWitt, Joe Watson, Wayne Phillips, Charles A. Sauer, Robert J. Naber, Leonard Gasiorek
Publikováno v:
SPIE Proceedings.
MEBES systems are characterized by constituent error performance, whereas masks produced on pattern generators are characterized by composite error performance. System evaluation by constituent specification is notable for the ease with which system