Zobrazeno 1 - 10
of 15
pro vyhledávání: '"Ji-Bum Kim"'
Publikováno v:
Journal of the Korean Physical Society. 60:1249-1252
Multiple surface plasmon resonances (SPRs) were observed in the [prism/Ag/SiO2 helical thin-film] Kretschmann configuration with a p-polarized incident beam. Simulation shows that multiple SPRs occur only for SiO2 helical film thicknesses greater tha
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cb7b24da6ec7e35298aed38e31bcfb63
https://doi.org/10.3938/jkps.60.1249
https://doi.org/10.3938/jkps.60.1249
Publikováno v:
Journal of the Korean Physical Society. 58:1026-1030
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::664c8b531fc457631208a1012c1e0a76
https://doi.org/10.3938/jkps.58.1026
https://doi.org/10.3938/jkps.58.1026
Publikováno v:
Journal of the Korean Physical Society. 58:915-919
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d75a207c4f01807dbe14153eb2038edf
https://doi.org/10.3938/jkps.58.915
https://doi.org/10.3938/jkps.58.915
Publikováno v:
Thin Solid Films. 519:1673-1676
A linear polarization selector was made from a three-section sculptured thin film deposited using an oblique angle deposition technique. In this device, the circular Bragg reflector with a left-handed helical structure was sandwiched in between two q
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::df6857db16cb7ce95a6a8d5cd8ee6084
https://doi.org/10.1016/j.tsf.2010.10.002
https://doi.org/10.1016/j.tsf.2010.10.002
Publikováno v:
Thin Solid Films. 520:1451-1453
Two surface plasmon resonance dips in reflectance angular spectrum for a p-polarized incident beam of a [prism/Ag/SiO 2 helical thin film] Kretschmann configuration are measured and compared with simulations. The simulation also shows that the angula
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::65e92689bd88da79448e30b52d03cd67
https://doi.org/10.1016/j.tsf.2011.10.001
https://doi.org/10.1016/j.tsf.2011.10.001
Publikováno v:
Surface and Coatings Technology.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8ca1a502fc365bc94faa50fc8bb8a398
https://doi.org/10.1016/j.surfcoat.2010.08.157
https://doi.org/10.1016/j.surfcoat.2010.08.157
Publikováno v:
Optical Interference Coatings.
In this study, a linear-polarization selector, made of a three-section sculptured thin film, is reported. Within the Bragg regime, the normal incident P-polarized light is transmitted through it, while the incident S-polarized light is reflected.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ac07cd09b854dedc7b0a4c735bcadd01
https://doi.org/10.1364/oic.2010.wc2
https://doi.org/10.1364/oic.2010.wc2
Autor:
Dae-Young Park, Ho-Yup Kwen, Seok-Jin Choi, Jun-Ho Choi, Seung-Han Ok, Deng-Chan Kim, Ji-Bum Kim, Nam-Sung Kim, Ilgweon Kim
Publikováno v:
2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432).
The novel junction process scheme in submicron DRAM cell with STI (Shallow Trench Isolation) has been investigated to improve the tail component in the retention time distribution which is of great importance in DRAM characteristics. In this paper, w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1de974cc441b498df51db36b5355cd94
https://doi.org/10.1109/iit.2000.924087
https://doi.org/10.1109/iit.2000.924087
Autor:
Jo-Bong Choi, Ji-Bum Kim, Ju-Seok Park, Nam-Sung Kim, Young-Woo Kweon, Ilgweon Kim, Sung-Cheul Kim, Jun-Ho Choy, Se-Kyeong Choi
Publikováno v:
Extended Abstracts of the 2001 International Conference on Solid State Devices and Materials.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fd2c8d6d6912a8a963059d1210473286
https://doi.org/10.7567/ssdm.2001.a-2-5
https://doi.org/10.7567/ssdm.2001.a-2-5
Publikováno v:
Advances in Natural Sciences: Nanoscience and Nanotechnology. 1:045005
Oblique angle deposition (OAD) is a sophisticated technique to fabricate engineered nanostructured thin films for next generation optical nanodevices. In this technique, oblique angle deposition and substrate rotation are employed to control the colu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4cccdcbc14cfc325070e1af4334efc93
https://doi.org/10.1088/2043-6262/1/4/045005
https://doi.org/10.1088/2043-6262/1/4/045005