Zobrazeno 1 - 10
of 19
pro vyhledávání: '"Ji Hong Jhe"'
Publikováno v:
Journal of the Korean Vacuum Society. 17:215-219
The bonding structure and composition of silicon nitride (SiNx) films were investigated by using Fourier transform infrared spectroscopy (FT-IR). SiNx films were deposited on Si substrate at using a conventional PECVD system. The compositions of Si a
Autor:
Jee Soo Chang, Ji-Hong Jhe, Se-Young Seo, Hansuek Lee, J.H. Shin, Jinku Lee, Namkyoo Park, Hak-Seung Han
Publikováno v:
IEEE Journal of Selected Topics in Quantum Electronics. 12:783-796
A review is presented of Si nanocluster sensitization of Er-doped silica for planar optical amplifiers using top-pumping 470-nm light-emitting diodes (LEDs). The motivation and basic physical principles underlying the nanocluster sensitization are fi
Autor:
Jung H. Shin, Moon-Seung Yang, Ji-Hong Jhe, Dae Won Moon, Kyung Joong Kim, Seung-Hui Hong, Suk-Ho Choi
Publikováno v:
Thin Solid Films. 478:21-24
The stoichiometry of SiOx layers in SiOx/SiO2 superlattice (SL) films grown by ion beam sputtering method was determined with in situ X-ray photoelectron spectroscopy. The effect of oxygen content on the photoluminescence (PL) properties was studied
Autor:
Dae Won Moon, JungHoon Shin, Ji-Hong Jhe, Moon-Seung Yang, Kyung Joong Kim, Se-Young Seo, Kwan-Sik Cho
Publikováno v:
Applied Physics Letters. 85:3408-3410
The effect of nitride passivation on the visible photoluminescence from nanocrystal Si (nc-Si) is investigated. Silicon-rich silicon nitride (SRSN) and silicon-rich silicon oxide (SRSO), which consist of nc-Si embedded in silicon nitride and silicon
Publikováno v:
Applied Physics Letters. 82:4489-4491
The characteristic interaction distance between Er3+ ions and carriers that excite them in Er-doped a-Si/SiO2 superlattices is investigated. Superlattice thin films consisting of 12 periods of a-Si/SiO2:Er/SiO2/SiO2:Er layers were deposited by ion sp
Publikováno v:
Applied Physics Letters. 79:287-289
The effect of the Si layer thickness on the Er3+ photoluminescence properties of the Er-doped Si/SiO2 superlattice is investigated. We find that the Er3+ luminescence intensity increases by over an order of magnitude as the Si layer thickness is redu
Publikováno v:
Applied Physics Letters. 76:3567-3569
The Er–carrier interaction and its effects on the Er3+ photoluminescence properties of erbium-doped Si/SiO2 superlattices are investigated. The interaction between the erbium atoms and the electronic carriers was controlled by doping erbium into th
Publikováno v:
Quantum Sensing and Nanophotonic Devices.
Nanocrystal Si (nc-Si) sensitization of Er in a silica matrix to obtain high optical activity in a Si-compatible material is investigated. Er-doped silicon-rich silicon oxide (SRSO) films, which consist of nc-Si embedded inside an SiO2 matrix, were d
Publikováno v:
SPIE Proceedings.
The Er3+ luminescent properties of Er-doped Si/SiO2 superlattices are investigated. The superlattices were deposited either by electron cyclotron resonance plasma enhanced chemical vapor deposition or by ultra-high vacuum ion beam sputter deposition
Publikováno v:
MRS Proceedings. 638
The effect of varying the Si layer thickness on the Er3+ photoluminescence properties of Er-doped Si/SiO2 superlattice is investigated. We find that as the Si layer thickness is reduced from 3.6 nm down to a monolayer of Si, the Er3+ luminescence int