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Simulation for Optimization of Mask Error Enhancement Factor by Design of Experiments in Both Dry and Immersion ArF Lithography

Autor: Chih−hung Lin, Kwei−tin Yeh, Ji−ren Hu, Wen−an Loong

Publikováno v: Japanese Journal of Applied Physics. 45:6216-6224

Simulations for the optimization of the mask error enhancement factor (MEEF) by using Taguchi's design of experiment (DOE) method in both dry and immersion ArF lithography have been demonstrated here. By DOE, MEEF has been successfully reduced, and t

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::4bcccc5ca3756f462c47df2e1593f89a
https://doi.org/10.1143/jjap.45.6216

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Modified Reflectance–Transmittance Method for the Metrology of Thin Film Optical Properties

Autor: Chih−hung Lin, Ji−ren Hu, Kwei−tin Yeh, Wen−an Loong

Publikováno v: Japanese Journal of Applied Physics. 45:1566-1569

Because the surface roughness of a thin film will cause light scattering, the reflectance (R) and transmittance (T) measured using a UV/visible (vis) spectrometer become lower than the actual values. The deviation becomes larger with increasing rough

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::3a5729f915d0c4288898529ec54e5156
https://doi.org/10.1143/jjap.45.1566

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