Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Jhi Yong Loke"'
Autor:
Guvanch Gurbandurdyyev, Kissan Mistry, Louis‐Vincent Delumeau, Jhi Yong Loke, Chee Hau Teoh, James Cheon, Fan Ye, Kam Chiu Tam, Kevin P. Musselman
Publikováno v:
ChemNanoMat. 9
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0d742b3ec4487d1f4b234375614807cd
https://doi.org/10.1002/cnma.202200498
https://doi.org/10.1002/cnma.202200498
Autor:
Hatameh Asgarimoghaddam, Ahmed Shahin, Mustafa Yavuz, Kevin P. Musselman, Louis-Vincent Delumeau, Khaled H. Ibrahim, Viet Huong Nguyen, Abdullah H. Alshehri, David Muñoz-Rojas, Alexander Jones, Jhi Yong Loke, Kissan Mistry
Publikováno v:
Advanced Functional Materials
Advanced Functional Materials, Wiley, 2021, 31 (31), pp.2103271. ⟨10.1002/adfm.202103271⟩
Advanced Functional Materials, Wiley, 2021, 31 (31), pp.2103271. ⟨10.1002/adfm.202103271⟩
International audience
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::400b7f8e1abb9a0e0e8e703b51c79d23
https://hal.univ-grenoble-alpes.fr/hal-03318864
https://hal.univ-grenoble-alpes.fr/hal-03318864
Autor:
Abdullah H. Alshehri, Kevin P. Musselman, Kissan Mistry, Jhi Yong Loke, Alexander Jones, David Muñoz-Rojas, Viet Huong Nguyen
Publikováno v:
ECS Meeting Abstracts. :1666-1666
Atmospheric-pressure spatial atomic layer deposition (AP-SALD) and chemical vapor deposition (AP-CVD) have been developed in recent years as scalable techniques for the rapid deposition of oxide thin films on different substrates for a variety of app
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fe736218fb52ec05562243b4bb206450
https://doi.org/10.1149/ma2020-02231666mtgabs
https://doi.org/10.1149/ma2020-02231666mtgabs