Zobrazeno 1 - 10
of 368
pro vyhledávání: '"Jes Asmussen"'
Publikováno v:
Diamond and Related Materials. 76:58-67
SCD substrates were successfully synthesized using an optimized pocket holder design. The pocket holder design creates an appropriate thermal environment to shield the diamond substrate from the intense microwave discharge. This substrate configurati
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::aa762ec3c33fa2dcc14ec411be7416e8
https://doi.org/10.1016/j.diamond.2017.04.010
https://doi.org/10.1016/j.diamond.2017.04.010
Autor:
Shreya Nad, Jes Asmussen
Publikováno v:
Diamond and Related Materials. 66:36-46
High quality single crystal diamond (SCD) substrates are required for several different important current applications. Microwave Plasma Assisted Chemical Vapor Deposition (MPACVD) is a convenient deposition method for high quality substrates. It is
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::91bb9c91ca7dc0fe8551cb6b3486b195
https://doi.org/10.1016/j.diamond.2016.03.007
https://doi.org/10.1016/j.diamond.2016.03.007
Publikováno v:
Diamond and Related Materials. 60:26-34
The high pressure (130–240 Torr) and high power density microwave plasma assisted chemical vapor deposition (MPACVD) of single crystal diamond (SCD) substrates is investigated. Locally controlled growth strategies that enable the synthesis of large
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2c1520dbac7503226e777d92f135a78d
https://doi.org/10.1016/j.diamond.2015.09.018
https://doi.org/10.1016/j.diamond.2015.09.018
The fundamental operational behavior of a microwave cavity plasma reactor was studied for pressures between 120 and 400 Torr, i.e. the plasma dimensions, the absorbed power density and the operational field map were measured and the reactor growth pe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::461a4f6238786784b520a8bc227f9dfc
https://publica.fraunhofer.de/handle/publica/250639
https://publica.fraunhofer.de/handle/publica/250639
Publikováno v:
Diamond and Related Materials. 42:8-14
Homoepitaxial chemical vapor deposition (CVD) of diamond requires high quality substrate crystals. This paper describes the process of diamond substrate crystal recovery so that the original substrate can be reused for multiple synthesis processes. A
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8e5b4ca5cce0f09a61d1816cfda35572
https://doi.org/10.1016/j.diamond.2013.11.011
https://doi.org/10.1016/j.diamond.2013.11.011
Autor:
Jes Asmussen, Campbell D. Carter, Stephen D. Hammack, Timothy A. Grotjohn, Tonghun Lee, Xing Rao
Publikováno v:
IEEE Transactions on Plasma Science. 39:3307-3313
The re-ignition phenomenon is observed when fuel/oxidizer is re-introduced into an atmospheric-pressure plasma discharge generated by cutting off the gas flow in a re-entrant microwave-plasma applicator system used for plasma-assisted ignition and co
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a8fa40021915ad23fb14c05442044a03
https://doi.org/10.1109/tps.2011.2161597
https://doi.org/10.1109/tps.2011.2161597
Autor:
Xing Rao, Tonghun Lee, Timothy A. Grotjohn, Indrek S. Wichman, Jes Asmussen, K. W. Hemawan, Campbell D. Carter
Publikováno v:
Proceedings of the Combustion Institute. 33:3233-3240
An atmospheric high-Q re-entrant cavity applicator is used to couple microwave (2.45 GHz) electromagnetic energy directly into the reaction zone of a premixed laminar methane–oxygen flame for flame enhancement. As microwave energy increases, a tran
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d89cee1ec0491fa6a37a1b4092be1769
https://doi.org/10.1016/j.proci.2010.06.024
https://doi.org/10.1016/j.proci.2010.06.024
Publikováno v:
Diamond and Related Materials. 19:1446-1452
Microwave plasma assisted synthesis of diamond is experimentally investigated using high purity, 2–5% CH4/H2 input gas chemistries and operating at high pressures of 180–240 Torr. A microwave cavity plasma reactor (MCPR) was specifically modified
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b3d610c19ce5a81d5ac3234c2b3842d3
https://doi.org/10.1016/j.diamond.2010.07.005
https://doi.org/10.1016/j.diamond.2010.07.005
Publikováno v:
Diamond and Related Materials. 19:778-782
Diamond etching is characterized using a microwave ECR plasma reactor with regard to etch rate selectivity, surface morphology, and feature size. Etching is performed on diamond substrates using a variety of etch mask materials including aluminum, ti
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8b33ad19f08c39464f784b96e0ebcde6
https://doi.org/10.1016/j.diamond.2010.02.001
https://doi.org/10.1016/j.diamond.2010.02.001
Autor:
Thomas Schuelke, Donnie K. Reinhard, Jes Asmussen, Michael Becker, Timothy A. Grotjohn, R. Ramamurti
Publikováno v:
Diamond and Related Materials. 17:1320-1323
The deposition of boron-doped homoepitaxial single crystal diamond is investigated using a microwave plasma-assisted chemical vapor deposition system. The objective is to deposit high-quality boron-doped single crystal diamond and establish the relat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6489b621765420a58311416c331997ff
https://doi.org/10.1016/j.diamond.2008.01.120
https://doi.org/10.1016/j.diamond.2008.01.120