Zobrazeno 1 - 10
of 11
pro vyhledávání: '"Jerzy Dora"'
Publikováno v:
Applied Acoustics. 190:108659
Autor:
Aleksandra Bielawska-Pohl, Piotr Jamroz, Jerzy Dora, Claudine Kieda, Anna Dzimitrowicz, Aleksandra Klimczak, Giovanni Busco, Agnieszka Krawczenko, Pawel Pohl, Aleksandra Baszczynska, Dominik Terefinko, Catherine Grillon
Publikováno v:
Plasma Chemistry and Plasma Processing
Plasma Chemistry and Plasma Processing, 2019, ⟨10.1007/s11090-019-10039-0⟩
Plasma Chemistry and Plasma Processing, Springer Verlag, 2019, ⟨10.1007/s11090-019-10039-0⟩
Plasma Chemistry and Plasma Processing, 2019, ⟨10.1007/s11090-019-10039-0⟩
Plasma Chemistry and Plasma Processing, Springer Verlag, 2019, ⟨10.1007/s11090-019-10039-0⟩
Skin injury leading to chronic wounds is of high interest due to the increasing number of patients suffering from this symptom. Proliferation, migration, and angiogenesis are key factors in the wound healing processes. For that reason, controlled pro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::aaa8b23d952077b18936b88308660c43
https://hal.science/hal-02354478/document
https://hal.science/hal-02354478/document
Autor:
Jerzy Dora, Agata Poniedziałek, Danuta Kaczmarek, Michal Mazur, Damian Wojcieszak, Jaroslaw Domaradzki
Publikováno v:
Materials Science-Poland, Vol 34, Iss 2, Pp 418-426 (2016)
Rapid progress in thin-film coatings based on metals, which can be deposited on polymers, has been recently observed. In this work discussion on the properties of modified polymers and silver thin films deposited on polytetrafluoroethylene (PTFE) and
Publikováno v:
Medical Hypotheses. 140:109636
In this work a new theory of acoustic signal detection in the inner ear and an experimental explanation of the causes of bifilar cochlear structure was presented. Our innovative approach describes sound detection in a completely different way from th
Publikováno v:
Surface and Coatings Technology. 228:S367-S373
The paper describes the effects of utilizing pulse valves for dosing a plasma forming gas supplied directly to the plasma source. The concept of exploiting such valves as actual controllers of the plasma process replacing the ignitrons–spark switch
Publikováno v:
Plasma Processes and Polymers. 4:S507-S511
Al2O3/Cr composite ceramic was ion-nitrided in N2 under atmospheric pressure. The plasma was generated by two different systems: an ac high voltage corona discharge, and an ac high voltage concentric dielectric barrier discharge. An analysis of the p
Autor:
M. Wicinski, B. Maier, Martin Stratmann, Jerzy Dora, Michael Rohwerder, Gerald S. Frankel, Adam Michalik
Publikováno v:
Corrosion Science. 49:2021-2036
Kelvin Probes can be modified to control as well as monitor potential. The design and operation of two different Kelvin Probe Potentiostats (KPPs) are described in this paper. One approach uses a permanent magnet and double coil to oscillate the need
Publikováno v:
Vacuum. 77:463-467
Widely used electron beam welding machines are equipped with heavy power supplies, located in a special oil tank and connected with an electron gun to a high-voltage cable. A special system detects electric discharges in the electron gun space, which
Autor:
Jerzy Dora, E. Talik, Rafal Chodun, Krzysztof Zdunek, Sebastian Okrasa, Katarzyna Nowakowska-Langier
Publikováno v:
Materials Science-Poland, Vol 32, Iss 2, Pp 171-175 (2014)
In 2011, we proposed a novel magnetron sputtering method. It involved the use of pulsed injection of working gas for the initiation and control of gas discharge during reactive sputtering of an AlN layer (Gas Injection Magnetron Sputtering — GIMS).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4d18ed18d952a0f3d9a123ec4d94a398
http://hdl.handle.net/20.500.12128/17227
http://hdl.handle.net/20.500.12128/17227
Autor:
Jaroslaw Domaradzki, B. Adamiak, Jerzy Dora, Danuta Kaczmarek, Michal Mazur, Damian Wojcieszak
Publikováno v:
2009 International Students and Young Scientists Workshop "Photonics and Microsystems".
In this paper new magnetron sputtering system for multilayers deposition has been presented. The system allows sputtering of different materials from 4 targets in low pressure of working and reactive gas (oxygen, argon, oxygen + argon). Manufactured