Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Jerry L. Hahnfeld"'
Autor:
David D. Devore, Jerry L. Hahnfeld
Publikováno v:
Polymer Degradation and Stability. 39:241-249
Hindered amine light stabilizers (HALS) have been bound to both the rubber and matrix phases of acrylonitrile-EPDM-styrene (AES) terpolymers. The stabilizers were incorporated by reaction of either 4-aminotetramethylpiperidine or 4-aminooxamidetetram
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::14c740574606ff30653a4fdb60046d66
https://doi.org/10.1016/0141-3910(93)90101-n
https://doi.org/10.1016/0141-3910(93)90101-n
Autor:
Mike Radler-Carol, Jason Niu, Brian G. Landes, Jerry L. Hahnfeld, Dorie Yontz, J. P. Quintana, Sebring Lucero, Brandon Kern, Danny King, Ted Stokich, Steve Weigand, Mohler Kacee Ouellette
Publikováno v:
MRS Proceedings. 766
The continual drive for faster interconnects requires the development of new interlayer dielectricmaterials with k values less than 2.1. Porous SiLKTM semiconductor dielectric resin wasdeveloped to achieve these low dielectric constants by introducin
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::93c19e768ca416d6983d2e8c9cd5e9e7
https://doi.org/10.1557/proc-766-e9.10
https://doi.org/10.1557/proc-766-e9.10
Autor:
Gary R. Buske, T. M. Stokich, H. C. Silvis, J. D. Perry, James P. Godschalx, Robert E. Hefner, John W. Lyons, K. B. Ouellette, Jerry L. Hahnfeld, Thomas H. Kalantar, Qing Shan J. Niu, R. J. Strittmatter, J. M. Dominowski, E. Mubarekyan
Publikováno v:
MRS Proceedings. 766
Porous SiLK resin is an ultra-low-k interlayer dielectric (ILD) material designed to meet the needs of the 65 nm technology node and beyond. In early 2002, the porous SiLK resin formulation was defined and scaled up, facilitating the tight monitoring
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::705cc18a153f3f80d744da44ef667123
https://doi.org/10.1557/proc-766-e7.5
https://doi.org/10.1557/proc-766-e7.5
Autor:
Jerry L. Hahnfeld, Donald J. Burton
Publikováno v:
Tetrahedron Letters. 16:1819-1822
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::af2fe8c813bd3d04a8634ca011c0b4d2
https://doi.org/10.1016/s0040-4039(00)75265-8
https://doi.org/10.1016/s0040-4039(00)75265-8
Autor:
Donald J. Burton, Jerry L. Hahnfeld
Publikováno v:
The Journal of Organic Chemistry. 42:828-831
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9e2d853cd721b7ec594d8048b2f512e1
https://doi.org/10.1021/jo00425a012
https://doi.org/10.1021/jo00425a012
Autor:
Donald J. Burton, Jerry L. Hahnfeld
Publikováno v:
Tetrahedron Letters. 16:773-776
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::911b85f9b2202c0ac1223d85d253769a
https://doi.org/10.1016/s0040-4039(00)71980-0
https://doi.org/10.1016/s0040-4039(00)71980-0
Publikováno v:
Chemischer Informationsdienst. 8
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e6919455ed1e22674854e4e76589a9b2
https://doi.org/10.1002/chin.197715107
https://doi.org/10.1002/chin.197715107
Publikováno v:
Journal of the American Chemical Society. 99:647-648
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9783cde64b91ad7b3178341cb06bcccb
https://doi.org/10.1021/ja00444a074
https://doi.org/10.1021/ja00444a074