Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Jerrin Chiu"'
Autor:
Dimitra Niakoula, Kenneth A. Goldberg, Tom Wallow, Jerrin Chiu, Christopher N. Anderson, Andy Ma, Paul Denham, Sungmin Huh, Bruno M. LaFontaine, Gideon Jones, Joo-on Park, Patrick P. Naulleau, Brian Hoef, Kim Dean
Publikováno v:
SPIE Proceedings.
Microfield exposure tools (METs) continue to play a dominant role in the development of extreme ultraviolet (EUV) resists. Here we present an update on the SEMATECH Berkeley 0.3-NA MET and summarize the latest test results from high-resolution line-s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d0cc8e2aa23df073eb87d67dbe393a1b
https://doi.org/10.1117/12.773833
https://doi.org/10.1117/12.773833
Autor:
Paul Denham, Joo-On Park, Warren Montgomery, Brian Hoef, Tom Wallow, Dimitra Niakoula, Patrick P. Naulleau, Chawon Koh, Bruno La Fontaine, Simi George, Jerrin Chiu, Stefan Wurm, Christopher N. Anderson, Andy Ma, Kim Dean, Kenneth A. Goldberg, Gideon Jones
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 27:66
Microfield exposure tools (METs) continue to play a dominant role in the development of extreme ultraviolet resists. One of these tools is the 0.3 numerical aperture SEMATECH Berkeley MET operating as a resist and mask test center. Here the authors p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::be44927118f8df354cfae67a3f4a7e92
https://doi.org/10.1116/1.3043473
https://doi.org/10.1116/1.3043473