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Autor:
Jeroen G. A. van Kasteren, Saravana B. Basuvalingam, Miika Mattinen, Andrea E. A. Bracesco, Wilhelmus M. M. Kessels, Ageeth A. Bol, Bart Macco
Publikováno v:
Chemistry of Materials, 34(17), 7750-7760. American Chemical Society
In this work, atomic layer deposition (ALD) has been employed to prepare titanium oxysulfide (TiOxSy) thin films. Compositional control was achieved through a supercycle approach, where the ALD processes of TiOx and TiSx were interleaved. ALD was per