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pro vyhledávání: '"Jeroen A. Smeltink"'
Autor:
Erwin John Van Zwet, Teun C. van den Dool, Jeroen A. Smeltink, David Nijkerk, Wouter D. Koek, Gregor van Baars
Publikováno v:
High-Power Laser Materials Processing: Applications, Diagnostics, and Systems VI.
TNO is developing a High Power Adaptive Mirror (HPAM) to be used in the CO2 laser beam path of an Extreme Ultra- Violet (EUV) light source for next-generation lithography. In this paper we report on a developed methodology, and the necessary simulati
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b2c5739e9d82e775a3a9c4ed83a292db
https://doi.org/10.1117/12.2249739
https://doi.org/10.1117/12.2249739
