Zobrazeno 1 - 10
of 154
pro vyhledávání: '"Jeong Hwan Han"'
Autor:
Sohyun Kim, Hyewon Choi, Hyejoong Jeong, Wilfredo Méndez Ortiz, Hwayeong Cheon, Jae Yong Jeon, Jae Hyeon Lee, Jeong Hwan Han, Kathleen J. Stebe, Daeyeon Lee, Hyunsik Yoon
Publikováno v:
Advanced Materials Interfaces, Vol 11, Iss 25, Pp n/a-n/a (2024)
Abstract Microneedle (MN) technology offers a powerful approach for transdermal delivery enabling painless injection and facilitating self‐administration without the need for professional assistance. However, the weak mechanical strength of MNs can
Externí odkaz:
https://doaj.org/article/b2624d75023e405fb0d7f7a645e80ff0
Autor:
Seong Ho Han, Raphael Edem Agbenyeke, Ga Yeon Lee, Bo Keun Park, Chang Gyoun Kim, Taeyong Eom, Seung Uk Son, Jeong Hwan Han, Ji Yeon Ryu, Taek-Mo Chung
Publikováno v:
ACS Omega, Vol 7, Iss 1, Pp 1232-1243 (2021)
Externí odkaz:
https://doaj.org/article/14964935eca54611ac6d5c4882248d31
Publikováno v:
Nanoscale Research Letters, Vol 15, Iss 1, Pp 1-8 (2020)
Abstract A sneak path current—a current passing through a neighboring memory cell—is an inherent and inevitable problem in a crossbar array consisting of memristor memory cells. This serious problem can be alleviated by serially connecting the se
Externí odkaz:
https://doaj.org/article/db1bb568f6ac4b74ab454eda779c89e9
Autor:
Seong Ho Han, Sheby Mary George, Ga Yeon Lee, Jeong Hwan Han, Bo Keun Park, Chang Gyoun Kim, Seung Uk Son, Myoung Soo Lah, Taek-Mo Chung
Publikováno v:
ACS Omega, Vol 2, Iss 9, Pp 5486-5493 (2017)
Externí odkaz:
https://doaj.org/article/9c535c768e3e4c92b946520580438c80
Autor:
Jungkyun Kim, Hakseung Rhee, Myeong Won Son, Juseong Park, Gwangmin Kim, Jae Bum Jeon, Hanchan Song, Geunwoo Kim, Byong-Guk Park, Jeong Hwan Han, Kyung Min Kim
Publikováno v:
ACS Applied Electronic Materials. 5:2447-2453
Autor:
Hyeonhui Jo, Seo Hyun Lee, Eun Seo Youn, Ji Eun Seo, Jin Woo Lee, Dong Hoon Han, Seo Ah Nam, Jeong Hwan Han
Publikováno v:
Journal of Korean Powder Metallurgy Institute. 30:53-64
Autor:
Myeong Jun Jung, Myeongjun Ji, Jeong Hwan Han, Young-In Lee, Sung-Tag Oh, Min Hwan Lee, Byung Joon Choi
Publikováno v:
Ceramics International. 48:36773-36780
Publikováno v:
Ceramics International. 47:28770-28777
Atomic layer deposition (ALD) is a thin-film fabrication method that can be used to deposit films with precise thickness controllability and uniformity. The low deposition temperature of ALD, however, often interrupts the facile crystallization of fi
Publikováno v:
Ceramics International. 47:25826-25831
In this study, we demonstrated the seed layer mediated growth of high-quality BaTiO3 (BTO) thin films using a two-step radio frequency (RF) magnetron sputtering process. Since the as-grown BTO thin films obtained by RF magnetron sputtering at the dep
Publikováno v:
Materials Science in Semiconductor Processing. 156:107258