Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Jens Rudolf"'
Autor:
Uwe Jens Rudolf
Malta, has been visited and influenced over the centuries by many different peoples and cultures. The site of the oldest free-standing, man-made structures known to exist, Malta has been occupied by Phoenicians, Carthaginians, Arabs, Normans, the Kni
Autor:
Sorg, Jens Rudolf
Im Rahmen dieser Arbeit konnten die Strukturen von 32 neuen Koordinationspolymeren (CPs) und acht neuen Komplexen auf Basis von Antimon- \bzw Bismuthalogeniden und N-Donor Liganden aufgeklärt werden. Davon konnten 26 CPs vollständig mittels diffrak
Autor:
Sorg, Jens Rudolf
Im Rahmen dieser Arbeit konnten die Strukturen von 32 neuen Koordinationspolymeren (CPs) und acht neuen Komplexen auf Basis von Antimon- \bzw Bismuthalogeniden und N-Donor Liganden aufgeklärt werden. Davon konnten 26 CPs vollständig mittels diffrak
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=od_______713::c3130f86268473bb5408f45bbd7f23d0
https://doi.org/10.25972/OPUS-21107
https://doi.org/10.25972/OPUS-21107
Publikováno v:
MECO
In IoT domain energy aware firmware development is critical for applications that run on mobile or battery constrained devices. Virtual system prototypes (VSP) empower developers to assess the application power consumption behavior before actual hard
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6c53088357cb3d12502c0ab8ffc5d78b
https://doi.org/10.1109/meco.2019.8759994
https://doi.org/10.1109/meco.2019.8759994
Autor:
Johann-P. Wolff, Sebastian Stieber, Tobias Rankl, Rainer Dorsch, Jens Rudolf, Christian Haubelt
Publikováno v:
CSE/EUC/DCABES
In mobile user interaction scenarios, gesture recognition applications often process inertial sensor data and run continuously to reduce latency. In this paper, we evaluate real-life efficiency gains of gesture detection on-loading onto microcontroll
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4d052cfe936acbc040101dcaa79277fd
https://doi.org/10.1109/cse-euc-dcabes.2016.162
https://doi.org/10.1109/cse-euc-dcabes.2016.162
Publikováno v:
Photomask Technology 2008.
The demands on CD metrology techniques in terms of both reproducibility and measurement uncertainty increase with decreasing critical dimensions (CD) on lithography masks. Additionally a full 3D characterization of the mask structures becomes more an
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9537e4c203b963d5c51cd95ded29f15d
https://doi.org/10.1117/12.800732
https://doi.org/10.1117/12.800732
Autor:
Scott D. Flamm, Imre Repa, Jeffrey J. Brown, Herbert Iliasch, Christoph Düber, Kjell Geterud, Manuela Aschauer, Mark E. Lockhart, E. J. R. Van Beek, Michael Stiskal, Jens Rudolf, Steve Wolff, Alain Blum, Thomas C. Yu, Paul Legmann, Thomas Kittner, Werner Judmaier, Peter Reimer, Christiane Blankenstein, Ibone Savalegui, Joan Falco Fages, Bernhard Kramann, Juan Ayuso, Marta Rodriguez Alvares, Allan W. Reid, Harald Ittrich, Eric de Kevviler, Gerda Leisinger
Publikováno v:
European journal of radiology. 64(3)
Purpose: To determine the most efficacious dose of gadodiamide for three-dimensional (3D) contrast-enhanced (CE) magnetic resonance angiography (MRA) of the renal arteries on a patient level based on the sensitivity in detecting the main hemodynamica
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6317ecfb782c5220a48cc2cf4ff68ab4
https://pubmed.ncbi.nlm.nih.gov/17412546
https://pubmed.ncbi.nlm.nih.gov/17412546
Autor:
Carola Bläsing, Jens Rudolf, Eric Cotte, Klaus Rinn, Gunter Antesberger, Wolfgang Fricke, Sven Knoth, Frank Laske, Benjamin Alles
Publikováno v:
SPIE Proceedings.
Following the international technology roadmap for semiconductors the image placement precision for the 65nm technology node has to be 7nm. In order to be measurement capable, the measurement error of a 2D coordinate measurement system has to be clos
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::09a0a6fe95b5da5a3e7864b5ca03d2ce
https://doi.org/10.1117/12.686089
https://doi.org/10.1117/12.686089
Publikováno v:
SPIE Proceedings.
The precise targeting of critical dimension (CD) features on photolithographic masks is an essential part of the mask production process. It is straight forward that the usual decrease of specification numbers can only be achieved using cutting edge
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::488de38d8c636b717090223dc034357b
https://doi.org/10.1117/12.681867
https://doi.org/10.1117/12.681867