Zobrazeno 1 - 10
of 13
pro vyhledávání: '"Jens Ringling"'
Autor:
I. Ahmad, R. de Bruijn, Jens Ringling, K. Gabel, T. D. Chin, Björn Mader, Jürgen Dr. Kleinschmidt, Guido Schriever, V. Korobotchko, D. Bolshukhin, S. Gotze, T. Brauner, A. Keller, Uwe Stamm, Jesko Dr. Brudermann, C. Ziener, A. Geier, Guido Hergenhan
Publikováno v:
SPIE Proceedings.
In the paper we report about the progress made at XTREME technologies in the development of EUV sources based on gas discharge produced plasma (GDPP) technologies and laser produced plasma (LPP) technologies. First prototype xenon GDPP sources of the
Autor:
R. de Bruijn, Jürgen Dr. Kleinschmidt, Uwe Stamm, K. Gabel, D. Bolshukhin, Jens Ringling, Guido Schriever, Chinh Duc Prof. Tran, Björn Mader, S. Gotze, A. Keller, Guido Hergenhan, Jesko Dr. Brudermann, V. Korobotchko, A. Geier, C. Ziener, I. Ahmad
Publikováno v:
SPIE Proceedings.
In the paper we report about the progress made at XTREME technologies in the development of EUV sources based on gas discharge produced plasma (GDPP) technologies as well as the integration of collector optics. Optics from different suppliers were in
Autor:
Vladimir Dr. Korobochko, Bjoern Mader, Kai Gaebel, Juergen Kleinschmidt, Henry Birner, Guido Hergenhan, Jesko Dr. Brudermann, Sven Goetze, Denis Bolshukhin, Uwe Stamm, Imtiaz Ahmad, Diethard Kloepfel, Guido Schriever, Frank Flohrer, Rainer Mueller, Tran Duc Chinh, Christian Ziener, Jens Ringling
Publikováno v:
High-Power Laser Ablation V.
The availability of extreme ultraviolet (EUV) light sources, measurement tools and integrated test systems is of major importance for the development of EUV lithography for use in high volume chip manufacturing which is expected to start in 2009. The
Autor:
Juergen Kleinschmidt, Tran Duc Chinh, Guido Hergenhan, Guido Schriever, Vladimir Korobotchko, Sven Goetze, Henry Birner, Imtiaz Ahmad, Rainer Mueller, Jens Ringling, Christian Ziener, Frank Flohrer, Uwe Stamm, Diethard Kloepfel, Björn Mader, Kai Gaebel, Denis Bolshukhin, Jesko Dr. Brudermann
Publikováno v:
SPIE Proceedings.
Semiconductor chip manufacturers are expecting to use extreme ultraviolet (EUV) lithography for high volume manufacturing of DRAMs and ICs starting by the end of this decade. Among all the technologies and modules which have to be developed EUV sourc
Autor:
Christian H. Ziener, Jesko Dr. Brudermann, Vladimir Korobotchko, Frank Flohrer, Jürgen Dr. Kleinschmidt, Sven Götze, Kai Dr. Gäbel, Uwe Stamm, Guido Hergenhan, Guido Schriever, D. Bolshukhin, Imtiaz Ahmad, Diethard Klöpfel, Istvan Balogh, Henry Birner, S. Enke, Chinh Duc Prof. Tran, Jens Ringling
Publikováno v:
SPIE Proceedings.
Semiconductor chip manufacturers are expecting to use extreme UV lithography for production in 2009. EUV tools require high power, brilliant light sources at 13.5 nm with collector optics producing 120 W average power at entrance of the illuminator s
Autor:
O B Khristoforov, Alexander S. Ivanov, Guido Schriever, Vladimir M. Borisov, Juergen Kleinschmidt, Jens Ringling, Vladimir Korobotchko, Frank Flohrer, Uwe Stamm, Sven Goetze, Aleksandr Yu. Vinokhodov, Peter Koehler, Kai Gaebel, Imtiaz Ahmad, Diethard Kloepfel
Publikováno v:
Emerging Lithographic Technologies VI.
Next generation semiconductor chip manufacturing using extreme ultraviolet (EUV) lithography requires a brilliant radiation source with output power between 50 W and 120 W in intermediate focus. This is about five to ten times higher power than that
Autor:
Vladimir M. Borisov, Uwe Stamm, Vladimir Korobotchko, Sven Goetze, Imtiaz Ahmad, Juergen Kleinschmidt, Aleksandr Yu. Vinokhodov, Jens Ringling, O B Khristoforov, Alexander S. Ivanov, Guido Schriever
Publikováno v:
Emerging Lithographic Technologies VI.
We report on the experimental status of the development of gas discharge produced plasma EUV sources for lithography based on the Z-pinch concept. The plasma size of approximately 1.3 mm X 1.5 mm has been matched to come close to the requirements res
Autor:
Imtiaz Ahmad, Vladimir Korobotchko, Peter Koehler, Guido Schriever, Kai Gaebel, Uwe Stamm, Frank Flohrer, Diethard Kloepfel, Sven Goetze, Jens Ringling, Juergen Kleinschmidt
Publikováno v:
Gas and Chemical Lasers and Intense Beam Applications III.
In this paper we discuss new results from investigations on high power EUV sources for micro-lithography based on gas discharge produced plasmas and laser produced plasmas. The EUV development is performed at XTREME technologies GmbH, a joint venture
Publikováno v:
SPIE Proceedings.
We report what is to our knowledge the first generation of femtosecond VUV radiation tunable in the spectral range from 102 - 124 nm generated by two photon-photon resonant and near resonant four-wave difference-frequency mixing ((omega) DF equals 2(
Publikováno v:
SPIE Proceedings.
Compact all-solid state laser sources are developed for femtosecond pulse generation tunable around 193 nm utilizing high peak power Ti:sapphire oscillator/amplifier systems and phase matched sequential sum frequency conversion in three (beta) -bariu