Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Jennifer Shumway"'
Autor:
Amine Lakcher, Gunwoong Lee, Geert Vinken, Ahmed Zayed, Ruxandra Mustata, Jay Jung, Beomki Shin, Arno van den Brink, Mohamed El Kodadi, Paul Böcker, Soo Kyung Lee, Jeongsu Park, Gratiela Isai, Taeddy Kim, Jan-Pieter van Delft, Sangjun Han, Yong-Sik Shin, Chanha Park, Jennifer Shumway
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXIV.
The market transition from 2D to 3D-NAND in recent years requires strict focus control and monitoring solutions. ASML’s μDBF targets (micro Diffraction Based Focus) enable on-product focus measurement which can be used to optimize scanner correcti
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7fcb522f2f82a1be31985ac620d89729
https://doi.org/10.1117/12.2552930
https://doi.org/10.1117/12.2552930
Autor:
S. E. Zuraw, Amanda Tan, Monica Harrelson, Rachel Kemp, Jennifer Shumway, Jennifer L. Ross, Alexander Chippendale
Publikováno v:
The Biophysicist. 1
Optics is an important subfield of physics required for instrument design and used in a variety of other disciplines, especially subjects that intersect the life sciences. Students from a variety of disciplines and backgrounds should be educated in t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d433df2a91bd34fe05ddf532bf5a7763
https://doi.org/10.35459/tbp.2019.000114
https://doi.org/10.35459/tbp.2019.000114
Autor:
Jens Reichelt, Jennifer Shumway, Nathan Neal, Robert Bonanni, Arjan Gijsbertsen, Sheldon Meyers, Justin K. Hanson, Young Ki Kim, Ferhad Kamalizadeh, Youri van Dommelen, Dionysios Petromanolakis
Publikováno v:
Optical Microlithography XXX.
With each technology node, overall focus budgets have become increasingly tighter in order to meet the necessary product requirements. The 7nm node has required us to define new opportunities for addressing top contributors to the focus budget. Field
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d7b83a8aa47fd60a240c8f90c7af3469
https://doi.org/10.1117/12.2258391
https://doi.org/10.1117/12.2258391