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Autor:
Asunción Fernández, Vanda Godinho, José Ávila, M. Carmen Jiménez de Haro, Dirk Hufschmidt, Jennifer López-Viejobueno, G. Eduardo Almanza-Vergara, F. Javier Ferrer, Julien L. Colaux, Stephane Lucas, M. Carmen Asensio
Publikováno v:
Nanomaterials, Vol 14, Iss 8, p 727 (2024)
Sputtering of silicon in a He magnetron discharge (MS) has been reported as a bottom-up procedure to obtain He-charged silicon films (i.e., He nanobubbles encapsulated in a silicon matrix). The incorporation of heavier noble gases is demonstrated in
Externí odkaz:
https://doaj.org/article/c74a44816f094c95bbcd8c74f1e8cad6
