Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Jen-Lang Lue"'
Autor:
Brian Pai, Jen-Lang Lue, Tings Wang, Hsuen-Cheng Liao, Sam Fan, Chin-Shun Lin, Hsien-Wen Liu, Atup Chiou
Publikováno v:
International Symposium for Testing and Failure Analysis.
This paper discusses the failure analysis process of a DC failure using an in-FIB (Focused Ion Beam) nanoprobing technique with four probes and a scanning capacitance microscope (SCM) in advanced DRAM devices. Current-Voltage (I-V) curves measured by
Publikováno v:
International Symposium for Testing and Failure Analysis.
Application of the high resolution of Transmission Electron Microscopy (HRTEM) plays a very important role in structural analysis and materials characterization for process evaluation and failure analysis in the Integrated Circuit (IC) industry. We s
Publikováno v:
International Symposium for Testing and Failure Analysis.
Three techniques have been developed for TEM sample preparation to improve efficiency in terms of time reduction and success rate. The first technique is to closely control the thickness of a sample for a specific area to less than 10µm by mechanica
Autor:
Jen-Lang Lue, Jen-Chung Chen, Cheng-Sung Huang, Shieh-Ming Chang, Yung-Yuan Chang, Ming-Yen Li, Wu Hsiao-Che
Publikováno v:
Journal of The Electrochemical Society. 154:H967
Aluminum oxide (Al 2 O 3 ) thin films have been prepared by the atomic layer deposition (ALD) using trimethylaluminum (TMA) and ozone (O 3 ) as precursors. The process pressure was varied from 200 mTorr to 1000 mTorr at 320°C, and its effect on the
Autor:
Jen-Lang Lue, Cheng-Sung Huang, Jen-Chung Chen, Wu Hsiao-Che, Shieh-Ming Chang, Yung-Yuan Chang, Ming-Yen Li
Publikováno v:
ECS Meeting Abstracts. :1072-1072
Aluminum oxide (Al 2 O 3 ) thin films have been prepared by the atomic layer deposition (ALD) using trimethylaluminum (TMA) and ozone (O 3 ) as precursors. The process pressure was varied from 200 mTorr to 1000 mTorr at 320°C, and its effect on the
Autor:
Ming-Yen Li, Yung-Yuan Chang, Hsiao-Che Wu, Cheng-Sung Huang, Jen-Chung Chen, Jen-Lang Lue, Shieh-Ming Chang
Publikováno v:
Journal of The Electrochemical Society; Nov2007, Vol. 154 Issue 11, pH967-H972, 6p, 3 Charts, 11 Graphs
Autor:
Ming-Yen Li, Yung-Yuan Chang, Hsiao-Che Wu, Cheng-Sung Huang, Jen-Chung Chen, Jen-Lang Lue, Shieh-Ming Chang
Publikováno v:
Journal of The Electrochemical Society; Nov2007, Vol. 154 Issue 11, pH967-H972, 6p, 3 Charts, 11 Graphs