Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Jelle Nije"'
Autor:
Masazumi Matsunobu, Henk Niesing, Chenxi Lin, Jeff Johnson, Alexander Ypma, Cyrus E. Tabery, Venky Subramony, Yi Zou, Linmiao Zhang, William Susanto, Dag Sonntag, Ravin Somasundaram, Bastani Vahid, Hakki Ergun Cekli, Zakir Ullah, Jelle Nije
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXII.
In addition to lithography process and equipment induced variations, processes like etching, annealing, film deposition and planarization exhibit variations, each having their own intrinsic characteristics and leaving an effect, a ‘fingerprint’,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::408cee4e7a6f3141074b7ffdefb3fe2a
https://doi.org/10.1117/12.2297304
https://doi.org/10.1117/12.2297304
Autor:
Dag Sonntag, Robert Jan Van Wijk, George A. Tsirogiannis, Jelle Nije, Manuel Giollo, Richard Johannes Franciscus Van Haren, Dimitra Gkorou, Alexander Ypma, Tom Hoogenboom, Geert Vinken
Publikováno v:
Conf. Computing Frontiers
In semiconductor manufacturing, continuous on-line monitoring prevents production stop and yield loss. The challenges towards this accomplishment are: 1) the complexity of lithography machines which are composed of hundreds of mechanical and optical
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::481a4fc9f7ccece57ee614176bf6d0ef
https://doi.org/10.1145/3075564.3078883
https://doi.org/10.1145/3075564.3078883