Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Jei-Wei Chang"'
Autor:
Anna Y. Q. Huang, Jei Wei Chang, Albert C. M. Yang, Hiroaki Ogata, Shun Ting Li, Ruo Xuan Yen, Stephen J. H. Yang
Publikováno v:
Educational Technology & Society, Vol 26, Iss 4, Pp 69-89 (2023)
To improve students’ learning performance through review learning activities, we developed a personalized intervention tutoring approach that leverages learning analysis based on artificial intelligence. The proposed intervention first uses text-pr
Externí odkaz:
https://doaj.org/article/aeccd7b05bbe4dd7a931d9eb3f8d2278
Autor:
Huang, Anna Y. Q.1 anna.yuqing@gmail.com, Jei Wei Chang1 a0978122159@gmail.com, Yang, Albert C. M.2,3 albertyang1994@gmail.com, Hiroaki Ogata4 hiroaki.ogata@gmail.com, Shun Ting Li1 ariel055132@g.ncu.edu.tw, Ruo Xuan Yen1 apple310565@gmail.com, Yang, Stephen J. H.1 stephen.yang.ac@gmail.com
Publikováno v:
Educational Technology & Society. Oct2023, Vol. 26 Issue 4, p69-89. 21p.
Autor:
Jei-Wei Chang, 張捷威
92
This thesis attempts to speak for problematizing the system of binary hierarchical oppositions underlying Western thought by offering an ecofeminist reading of Marge Piercy’s first science fiction Woman on the Edge of Time (1976), which jus
This thesis attempts to speak for problematizing the system of binary hierarchical oppositions underlying Western thought by offering an ecofeminist reading of Marge Piercy’s first science fiction Woman on the Edge of Time (1976), which jus
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/49176883125977478492
Autor:
Gus Yeh, James L. Chao, Cherng-Chyi Han, D. Chabbra, Zhaoguo Jiang, Cheng Tzong Horng, Terry Torng, M. Sullivan, H.L. Hu, Brij B. Lal, Jei-Wei Chang, Yimin Guo, Ming M. Yang, S. Malhotra, Kochan Ju
Publikováno v:
IEEE Transactions on Magnetics. 35:683-688
We have demonstrated magnetic recording at an areal density of 5 Gb/in/sup 2/ using dual stripe magnetoresistive heads (DSMR) on low noise and low-glide height quaternary CoCrTa-based alloy thin film disks. The data rate is 120 Mb/sec with a PR4 chan
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c2c6650f94689231abd7acfc6e571dbc
https://doi.org/10.1109/20.750628
https://doi.org/10.1109/20.750628
Autor:
Jei-Wei Chang, Chao-Peng Chen
Publikováno v:
SPIE Proceedings.
Although semiconductor industry ramps the products with 90 nm much quicker than anticipated [1], magnetic recording head manufacturers still have difficulties in producing sub-100 nm read/write trackwidth. Patterning for high-aspectratio writer requi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3faf9ccfe00431561e45f89d5ea6360d
https://doi.org/10.1117/12.654547
https://doi.org/10.1117/12.654547
Publikováno v:
IEEE Transactions on Magnetics. 33:2827-2829
The ABS focused ion beam technique was utilized to pattern MR heads into different geometry at track edges to study side-writing performance. By spinstand testing, both written track width and erase distance were measured. An analytical model was dev
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9b3b35d68681adc4594366a7f3c4f96c
https://doi.org/10.1109/20.617745
https://doi.org/10.1109/20.617745
Publikováno v:
SPIE Proceedings.
Lift-off process is widely used to pattern small-dimension features for microelectronics. To do lift-off process, one needs to have bi-layer photoresist with desired undercut. As the critical dimension (CD) of devices is decreased, the process become
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dd4941a3779ad5abbccf926d539e6a54
https://doi.org/10.1117/12.584174
https://doi.org/10.1117/12.584174
Autor:
Chao-Peng Chen, Jei-Wei Chang
Publikováno v:
SPIE Proceedings.
Conventional lift-off process uses dual-layer resists for transferring image into the substrate (top layer) and releasing the deposit (bottom layer). However, as the critical dimension of top layer approaches sub-100 nm, the undercut of bottom layer
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b2d4144f19400995c1425d43fb5d86d7
https://doi.org/10.1117/12.530381
https://doi.org/10.1117/12.530381
Publikováno v:
SPIE Proceedings.
In this communication, we presented a novel approach to reduce critical dimension of resist features. The proposed method involves two process steps: resist pattern formation and critical dimension reduction. This concept was demonstrated to produce
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::69d2e420e62ca432f5526fb118fd2eac
https://doi.org/10.1117/12.484681
https://doi.org/10.1117/12.484681