Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Jei-Ming Chen"'
Autor:
Jack Hung, Cheng-Pu Chiu, Chien-Lin Weng, Yi-Jing Wang, Yun-Ru Chen, Yeh-Sheng Lin, Sheng-Yuan Hsueh, Chien Chung Huang, Jei-Ming Chen, Albert H.-B. Cheng, Bin-Siang Tsai, Ho-Yu Lai, Yen Chun Liu
Publikováno v:
IRPS
Here we demonstrate the copper/dielectric TDDB improvement of 8 metal layers in 28nm technology node with 90 nm pitch. After the process optimization, the Weibull slope of MOM TDDB increase from 0.85 to 1.28 that improves the estimated MOM TDDB about
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::96ea5963ce49312140aa7d686b59fbef
https://doi.org/10.1109/irps.2015.7112701
https://doi.org/10.1109/irps.2015.7112701
Publikováno v:
IEEE Electron Device Letters. 32:1725-1727
The effect of CESL stressor on the morphological stability of the Pt-dissolved NiSi1-xGex films formed on Si0.72Ge0.28 is demonstrated for the first time. In the CESL stress range studied, no high-resistivity phase is found in the silicide layer, but
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6babc045a37c82a311e127b5fa0c4048
https://doi.org/10.1109/led.2011.2166991
https://doi.org/10.1109/led.2011.2166991
Publikováno v:
Journal of Chromatography A. 891:207-215
This study investigated the effect of pressure on the retention behavior of a model protein, lysozyme, on octadecylsilica (C 18 ) stationary phase under various equilibrium conditions. It is demonstrated that the retention time of the lysozyme was in
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e4824bc770d811733572f7cc51ea1ab7
https://doi.org/10.1016/s0021-9673(00)00638-5
https://doi.org/10.1016/s0021-9673(00)00638-5