Zobrazeno 1 - 10
of 27
pro vyhledávání: '"Jeffrey S. Hale"'
Publikováno v:
Surface and Coatings Technology. 357:114-121
The performance of an optical coating stack depends on thickness and refractive index of each layer. In situ spectroscopic ellipsometry (SE) can track coating properties in real-time, but ex situ SE characterization is limited by the large number of
Autor:
Michael Stadermann, Jianing Sun, James N. Hilfiker, Chantel Aracne-Ruddle, Jeffrey S. Hale, T. E. Tiwald, Philip E. Miller
Publikováno v:
Applied Surface Science. 421:508-512
It is a well-known challenge to determine refractive index (n) from ultra-thin films where the thickness is less than about 10 nm [1,2]. We discovered an interesting exception to this issue while characterizing spectroscopic ellipsometry (SE) data fr
Publikováno v:
Journal of Vacuum Science & Technology B. 38:014001
The flexibility of the Kramers–Kronig-consistent basis spline (B-spline) function provides advantages over traditional physics-based oscillator functions for analyzing infrared spectroscopic ellipsometry data. Oscillator functions require that the
Autor:
Blaine D. Johs, Jeffrey S. Hale
Publikováno v:
physica status solidi (a). 205:715-719
Accurate dielectric function values are essential for spectroscopic ellipsometry data analysis by traditional optical model-based analysis techniques. In this paper, we show that B-spline basis functions offer many advantages for parameterizing diele
Autor:
John A. Woollam, Thomas E. Tiwald, C. L. Trimble, Michael J. DeVries, Jeffrey S. Hale, Daniel W. Thompson
Publikováno v:
Thin Solid Films. :26-34
A prototypical small area electrochromic device was fabricated, and emissivity was measured from 1 to 30 microns. The devices show change in emissivity from about 0.60 to about 0.68, that is a total modulation of 13%. The emittance performance was ca
Autor:
Thomas E. Tiwald, Jeffrey S. Hale, C. L. Trimble, Michael J. DeVries, John A. Woollam, Daniel W. Thompson
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 17:2906-2910
Crystalline WO3−x is an infrared (IR) electrochromic material having possible applications in satellite thermal control and IR switches. Optical constants of electrochromic materials change upon ion intercalation, usually with H+ or Li+. Of primary
Autor:
Jeffrey S. Hale, John A. Woollam
Publikováno v:
Thin Solid Films. 339:174-180
Electrochromic devices were investigated as a means of efficiently modulating the IR emissivity of space structures. The optical properties of electrochromic materials are modified upon application of a voltage allowing a high degree of control of th
Publikováno v:
Thin Solid Films. :205-209
Electrochromic materials are being studied for applications involving infrared emissivity modulation. The materials being investigated are amorphous WO3 and poly-crystalline WO3, NiO, and Ta2O5. Hydrogen ions are intercalated into and deintercalated
Publikováno v:
Surface and Coatings Technology. 90:150-155
Thin films of aluminum were exposed in short increments to a plasma environment using a semiconductor plasma asher. The process gas was a mixture of air and oxygen. The total exposed oxygen fluence was 1.2 × 10 21 oxygen atoms cm −2 accumulated ov
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 14:3075-3081
The low Earth orbit ~LEO! environment is commonly simulated using oxygen plasma ashers to determine the effects of LEO on spacecraft materials. However, plasma ashers can also contaminate samples during plasma exposure, making them less than ideal fo