Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Jeffrey Riendeau"'
Autor:
Justin Clements, Vandana Venkatasubramanian, Christa Montgomery, Eswar Ramanathan, Jeffrey Riendeau, Veenadhar Katragadda, Alan Cusick, Edwin Soler, Qiushi Wang, Jay Mody, Lloyd Smith, Arthur Gasasira, Shafaat Ahmed, Colin Bombardier, Petrov Nicolai, Bill Evans, Raymond Krom, Martin Muthee, Michael Hatzistergos, Owen Brown, Jung Tae Hwang, Jian Qiu, Vincent Liao, Kok Hin Teo
Publikováno v:
2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
Inline electrical testing in a semiconductor fabrication line is a very common method to monitor the line performance and to be able to detect any issue for the tested wafers. This helps to detect the problems much earlier. Detecting issues earlier n
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ff7464b8c4d2cfd95d8c83042d070e96
https://doi.org/10.1109/asmc.2019.8791826
https://doi.org/10.1109/asmc.2019.8791826
Autor:
Laurent Dumas, Eswar Ramanathan, Scott Hildreth, Mary Claire Silvestre, Jeffrey Riendeau, Mark Duggan
Publikováno v:
2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
As a technology ramps up to volume manufacturing, it becomes imperative that variability in yield is reduced. One of the leading contributors to this variation is coming from the wafer edge where uniformity in film thickness significantly rolls-off.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::55b367d6a68a333ff8fda54172807855
https://doi.org/10.1109/asmc.2016.7491136
https://doi.org/10.1109/asmc.2016.7491136
Autor:
Jeffrey Riendeau, Louis Kindt, Jason M. Benz, Jay S. Burnham, Christy Johnson, Christopher Magg, Adam C. Smith, R. Kontra
Publikováno v:
SPIE Proceedings.
At the challenging ground rules required for 90 nm and 65 nm photomask production, new types of photomask defects are becoming increasingly prevalent. This paper discusses one particular new defect type found on critical 90 nm embedded attenuated pha
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4337d891f0ea457be41cc07af905f59e
https://doi.org/10.1117/12.570563
https://doi.org/10.1117/12.570563