Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Jeffrery C. Shearer"'
Autor:
Seiji Nagahara, Arnaud Dauendorffer, Xiang Liu, Tomoya Onitsuka, Hisashi Genjima, Noriaki Nagamine, Yuhei Kuwahara, Yuya Kamei, Shinichiro Kawakami, Makoto Muramatsu, Satoru Shimura, Kathleen Nafus, Noriaki Oikawa, Yannick Feurprier, Marc Demand, Sophie Thibaut, Alexandra Krawicz, Steven Grzeskowiak, Katie Lutker-Lee, Eric Liu, Christopher Catano, Joshua D. LaRose, Jeffrery C. Shearer, Lior Huli, Philippe Foubert, Danilo De Simone
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2022.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::45726dd0148c7dbb78756f0430b9d1a4
https://doi.org/10.1117/12.2642941
https://doi.org/10.1117/12.2642941
Publikováno v:
Design-Process-Technology Co-optimization XV.
We propose a machine-learning-based mechanism to perform OPC, which is much more efficient than traditional OPC processes in terms of compute resources. Building a physical model for OPC takes a lot of labor and computational time, for example, model
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::842561759419e20b7fe260962c0254eb
https://doi.org/10.1117/12.2584621
https://doi.org/10.1117/12.2584621