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pro vyhledávání: '"Jefferson O. Nemelka"'
Autor:
Jefferson O. Nemelka
Publikováno v:
SPIE Proceedings.
In order to meet the needs of multiple customers with varying design specifications, merchant photomask suppliers need to provide photomasks for a wide range of design patterns. Some masks require etching less than 1% of the total mask film, while ot
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9d2d846ac98f982343138abd20756d35
https://doi.org/10.1117/12.518067
https://doi.org/10.1117/12.518067
