Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Jeff Hawthorne"'
Publikováno v:
IEEE Transactions on Semiconductor Manufacturing. 26:315-318
In this paper we discuss the detection, investigation and remediation of a silicon pitting defect in gate oxide patterning processes. The pitting defect is detected by optical inspection after an oxide wet etch operation. The cause of the physical de
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::29e742750cb0e8d56c7eacf7be55f564
https://doi.org/10.1109/tsm.2013.2259271
https://doi.org/10.1109/tsm.2013.2259271
Publikováno v:
Solid State Phenomena. :109-112
The monitoring and optimization of wet clean and surface preparation processes is a major challenge in the microelectronics industry [1, 2]. Today, the main methods used in clean rooms are visual inspection by light scattering (principally applied to
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1ca2798b590b1ced2940dc2e491356dd
https://doi.org/10.4028/www.scientific.net/ssp.145-146.109
https://doi.org/10.4028/www.scientific.net/ssp.145-146.109
Publikováno v:
Solid State Phenomena. 134:289-292
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ef3df7319166b09073707da0419992b5
https://doi.org/10.4028/www.scientific.net/ssp.134.289
https://doi.org/10.4028/www.scientific.net/ssp.134.289
Autor:
David L. Freeman, Jeff Hawthorne
Publikováno v:
SID Symposium Digest of Technical Papers. 31:375-377
In the later half of 2000, display manufacturers will begin mass producing displays with resolutions from 150 to 200 pixels/in. These displays will have a color sub-pixel pitch of from 42 to 56 mm. For array inspection and test equipment, reduced pix
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1bccebd916e9fb1c62dad16d743a9c5f
https://doi.org/10.1889/1.1832960
https://doi.org/10.1889/1.1832960
Publikováno v:
ECS Meeting Abstracts. :784-784
not Available.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b98fa35ec5415de000b759a463e58618
https://doi.org/10.1149/ma2005-02/20/784
https://doi.org/10.1149/ma2005-02/20/784
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