Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Jeff Fan"'
Autor:
Jean-Francois Cote, Jeff Fan, Sean Shen, Givargis Danialy, Marcin Lipinski, Michael Garbers, Wu Yang, Martin Keim, Andreas Glowatz, Joe Reynick, Ayush Patel, Joanna Michna
Publikováno v:
IEEE Design & Test. 39:17-25
Autor:
I.-Y. Chang, Mao-Yuan Hsia, Man-Ting Pang, Hanson Peng, Huaxing Tang, Wu Yang, Manish Sharma, Jeff Fan
Publikováno v:
ITC
Statistical analysis based on layout-aware scan diagnosis has been successfully used for identifying defect root causes and reducing physical failure analysis (PFA) efforts, especially for interconnect defects. With increasing complexity and density
Autor:
Rong Lv, ChengHua Yang, Chih-Yuan Lu, Hsiang-Chou Liao, Donghua Liu, Chi-Min Chen, Ling-Wu Yang, Tuung Luoh, Jeff Fan, Kuang-Chao Chen, Tahone Yang
Publikováno v:
2013 e-Manufacturing & Design Collaboration Symposium (eMDC).
Yield impacting systematic defects finding is no longer just relied on Design Rule Checking (DRC) provided by designer or Lithography Rule Checking (LRC) provided by post-optical proximity correction (OPC) results. An inspection flow is proposed in t
Autor:
Jeff Fan, Kwoting Fang
Publikováno v:
2006 Technology Management for the Global Future - PICMET 2006 Conference.
The present research develops and tests a theoretical extension of DeLone and McLean's model of information system (IS) success that explains personnel belief that contributes to user's utilization of ERP (Enterprise Resource Planning) systems. The e
Autor:
Jeff Fan, Gary Oosta
Publikováno v:
Genetic Engineering & Biotechnology News. 33:13-13
Autor:
Chimin Chen, ChengHua Yang, Hsiang-Chou Liao, Tuung Luoh, Ling-Wu Yang, Tahone Yang, Kuang-Chao Chen, Chih-Yuan Lu, Donghua Liu, Jeff Fan, Rong Lv
Publikováno v:
2013 e-Manufacturing & Design Collaboration Symposium (eMDC); 2013, p1-3, 3p