Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Jeff Eisele"'
Autor:
Andrew J. Blakeney, John P Hatfield, Binod De, Plamen Tzviatkov, Scott Scales, Stephanie Dilocker, Jeff Eisele, Murrae J. Bowden, Sanjay Malik, Tadayoshi Kokubo
Publikováno v:
Journal of Photopolymer Science and Technology. 15:637-642
Optical absorbance data on a variety of acetal-derivatized hydroxystyrene based polymers are reported at 157nm. Acetals based on tertiary butyl, cyclohexyl ethyl and a silicon-derivative show improved transparency of the corresponding polymers compar
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f8caec4cde41cac5a297fe461654665e
https://doi.org/10.2494/photopolymer.15.637
https://doi.org/10.2494/photopolymer.15.637
Publikováno v:
Journal of Photopolymer Science and Technology. 13:513-518
Polymers based on tertiary-butyl acrylate were synthesized with different compositions and glass transition temperature (Tg) values. These polymers are formulated identically and exposed under identical optical conditions. Lithographically, these pol
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::33f63adc87036fc4e66297651ca93f5c
https://doi.org/10.2494/photopolymer.13.513
https://doi.org/10.2494/photopolymer.13.513
Autor:
Yasumasa Kawabe, Shiro Tan, Larry Ferreira, Sanjay Malik, Allyn Whewell, Murrae J. Bowden, Tadayoshi Kokubo, Tori Fujimori, Jeff Eisele
Publikováno v:
Journal of Photopolymer Science and Technology. 13:507-512
The outgassing issues that have long plagued conventional acetal resist designs are shown to be significantly mitigated depending on the structure of the acetal-blocked polymer. Resists formulated with acetal-blocked polymers based on low molecular w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cab3bccebd158d86bc850cc73cfcb5d5
https://doi.org/10.2494/photopolymer.13.507
https://doi.org/10.2494/photopolymer.13.507