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pro vyhledávání: '"Jean-I. Choe"'
Publikováno v:
The Transactions of The Korean Institute of Electrical Engineers. 61:585-589
The characteristics of interface layer and the effect of mole fraction of inlet gas mixture() on the microstructure of Ti(B,N) films were studied by microwave plasma hot filament CVD process. Ti(B,N) films were deposited on a substrate(STD-61) to dev
Autor:
Jean I. Choe, Yong Choi
Publikováno v:
The Transactions of The Korean Institute of Electrical Engineers. 61:89-93
c-BN films were deposited on SKH-51 steels by electron assisted hot filament CVD method and microstructure development was studied processing parameters such as bias voltage, temperature, etching and phase transformation at boundary layer between BN